2015
DOI: 10.1149/2.0031602jss
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Infiltration of ZnO in Mesoporous Silicon by Isothermal Zn Annealing and Oxidation

Abstract: In this work a two-step procedure is reported for the formation of ZnO/porous silicon (PS) composites in which ZnO is embedded in the pores of sponge like mesoporous silicon. The procedure consists of an isothermal annealing of the PS layer in Zn vapors using a close space configuration and a subsequent oxidation of the Zn infiltrated in the pores. The oxidation agent and the annealing duration are optimized for a complete oxidation of the infiltrated Zn. Structure, morphology and composition of the samples we… Show more

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