The paper reviews the nanoindentation behaviour of III-V semiconductors under concentrated load and its implication for optoelectronic-device design. We consider first, fundamental aspects involved into the mechanical resistance to contact loading of semiconductor single crystals (elastic-plastic transition, indentation strain, hardness-yield relationship). The paper then describes recent applicative studies aimed at improving the heterostructure quality used in optoelectronic applications and emphasizes the so-called mechanical design (alloying and compliant substructure).1 Introduction Mechanical properties of semiconductors have been surveyed for many years (for a review refer to [1]) as these data have been very useful to improve the handling of the materials during device processing. Compression test has been used extensively to study the plastic behaviour as a function of temperature. Going to temperatures close and below the brittle-ductile transition (typically below 0.3-0.5 T m where T m is the melting temperature), confining pressure and predeformation are necessary to prevent samples fracture. In this domain, indentation tests become very useful since plastic deformation can be produced under concentrated load without fracture. Microindentation was extensively used also to introduce dislocations of known type say α or β which were subsequently characterized electrically by electron beam induced current (EBIC), deep level transient spectroscopy (DLTS), cathodoluminescence (CL) [2,3]. So far, the nature of these dislocations started to be questioned while pioneeering transmission electron microscopy (TEM) studies were published by Höche and Scheiber [4] and Lefebvre et al. [5]. They revealed complex dislocations arrangements (anisotropic microtwinning and perfect dislocations) which have been debated until nowadays. During the last 20 years, the development of the nanoindentation technique has allowed monitoring deformations in the milli-and micro newton regime (for a review refer to [6]). Subsequent, indentation fracture can be avoided even at room temperature [7]. However, the material flow under an indenter is complex as high stress concentrations are generated and this has considerably hardened the investigations. The works have concentrated firstly on bulk single crystals and progress in the understanding of the plastic flow is reported here. More recently, the nanoindentation technique was applied to the characterization of heterostructures and compliant substructures developed for optoelectronics [8,9]. In fact, the optical and electrical properties of heterostructures are deteriously affected by threading dislocations that are generated in lattice-mismatched structures. A better knowledge of the plastic behaviour of heterostructures is needed to improve their performance. On the other hand, new routes are investigated to avoid plastic relaxation in the operative part of the heterostructure. Compliant substructures have been developed in order to concentrate the plastic relaxation