1999
DOI: 10.1049/el:19990952
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Increased-area oxidised single-fundamental mode VCSEL with self-aligned shallow etched surface relief

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Cited by 38 publications
(14 citation statements)
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“…As opposed to previous samples, where surface etching only introduced a certain limited single-mode operation range to devices of up to 7 µm diameter [8], the improved layer structure and processing have much augmented the effect. The comparison of unetched devices and etch spots of 3 and 5 µm diameter on 11 µm oxide aperture VCSELs in Fig.…”
Section: Output Characteristicsmentioning
confidence: 79%
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“…As opposed to previous samples, where surface etching only introduced a certain limited single-mode operation range to devices of up to 7 µm diameter [8], the improved layer structure and processing have much augmented the effect. The comparison of unetched devices and etch spots of 3 and 5 µm diameter on 11 µm oxide aperture VCSELs in Fig.…”
Section: Output Characteristicsmentioning
confidence: 79%
“…As described previously, our self-aligned surface etching process allows to align the surface relief automatically to the oxide aperture respective mesa with high precision by only one additional photoresist step [8]. Fig.…”
Section: Device Structure and Processingmentioning
confidence: 99%
See 1 more Smart Citation
“…An early demonstration showed the remarkable effect of the surface relief on the modal and beam characteristics of an oxide-confined VCSEL [55]. With further optimizations of oxide and surface relief diameters, and using a fabrication technique for self-alignment of the surface relief to the oxide aperture [56], a single-mode power of 3.4 mW was achieved at 850 nm [57].…”
Section: Single-mode Emission From Inherently Multimode Vcselsmentioning
confidence: 99%
“…Several approaches were perused to develop single-mode VCSELs with increased aperture diameter such as antiresonant reflecting [4], the combined application of implant and oxide apertures [5], use of Bragg reflectors partially disordered by Zn-diffusion [6], extending the optical cavity [7], effective index guiding based on the photonic crystal structure [8], increasing the high-order mode loss by the shallow surface-relief etching [9] and the two-dimensional triangular holey structure [10]. However, these techniques involve complex extra processing or a hybrid configuration highly sensitive to misalignment and mechanical disturbances, which, in the end, hampers a low-cost and highyield manufacturing.…”
Section: Introductionmentioning
confidence: 99%