In-situ multi-step pulsed vapor phase surface functionalization of zirconia nanoparticles via copper-free click chemistry

Šarić, Iva; Marković, Maria Kolympadi; Peter, Robert; Linić, Petra; Wittine, Karlo; Piltaver, Ivna Kavre; Badovinac, Ivana Jelovica; Marković, Dean; Knez, Mato; Ambrožić, Gabriela

doi:10.1016/j.apsusc.2020.148254

Cited by 6 publications

(2 citation statements)

References 41 publications

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“…11 Recently, the field of MLD has received renewed interest as evident by the exploration of new MLD chemistries, like for example, in the form of ring opening mechanisms 12,13 and click reactions. 14 Further, hybrid organic-inorganic films can also be prepared using common metal-organic precursors and bifunctional organic co-reactants such as alcohols, 13,15,16 phenols, 17 amines 18 and acids. 19 By selecting appropriate precursors and co-reactants, the chemical, mechanical and electrical properties of these hybrid films can be tuned to the benefit of applications such as flexible diffusion barriers, 20,21 low-k dielectric materials, 22 flexible transparent and conducting coatings, 23 non-volatile memories 24,25 and lithium-ion batteries.…”

Section: Introductionmentioning

confidence: 99%

About the importance of purge time in molecular layer deposition of alucone films

Jain

Poodt

2021

Dalton Trans.

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Section: Introductionmentioning

confidence: 99%

About the importance of purge time in molecular layer deposition of alucone films

Jain

Poodt

2021

Dalton Trans.

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“…New organic components have also been developed for the purely organic MLD processes; the MLD material library already includes, besides the initially introduced polyimides [ 15,17–22,137–143 ] and polyamides, [ 15,23–28,144–149 ] many other polymers: polyurea, [ 29,30,37,38,51,150–164 ] polythiourea, [ 52 ] polyurethane, [ 165,166 ] polyazomethine, [ 167–172 ] poly(3,4‐ethylenedioxy‐thiophene), [ 173–177 ] polyimide–polyamide, [ 141 ] poly(ethylene terephthalate) (PET), [ 50,178–180 ] and others. [ 31,32,39–44,176,181–200 ] In recent years, the organic precursor library has been rapidly expanding. We have collected in Table 1 the organic precursors so far used in ALD/MLD processes, together with the heating temperatures employed for their evaporation in the corresponding process conditions; [ …”

Section: Organic Precursors In Ald/mldmentioning

confidence: 99%

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Multia

Karppinen

2022

Adv Materials Inter

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organic ligands act as bridges between the metal centers to form infinite 1D, 2D, or 3D structures. These materials are often referred to as coordination polymer (CP) [1] or metal-organic framework (MOF) [2] materials; the latter term is used when the metal-organic material is crystalline and highly porous. [3] The research field of CP-and MOF-type materials has grown tremendously over the last two decades. The structural and chemical diversity of these materials has served as a continuous source of scientific excitement; the same diversity has also triggered huge technological interest as these materials possess enormous potential to be tailored for a wide variety of applications ranging from gas capture, storage, and separation to sensing, catalysis, optics, electronics, and energy storage. [4][5][6][7] Most of the targeted application breakthroughs of metal-organics require that these materials can be produced as highquality thin films and coatings, which can be integrated with the other components in the actual device configuration. The possibility to deposit such thin films in an industry-feasible manner on the substrate types needed, would be a major step forward in the field. [8] Traditionally, solvent-based processes such as liquid-phase epitaxy, Langmuir-Blodgett, layer-by-layer, and electrochemical deposition techniques have been used for metal-organic thin films. [9][10][11] These are, however, incompatible with the requirements set by the possible integration of the materials in microelectronics. This is due to corrosion and contamination risks, and the problems in patterning and precise deposition on high-aspect-ratio features. Hence, it is vital to develop solventfree thin-film deposition routes for the metal-organic material family. In the optimal case, these deposition methods should allow conformal coatings on large-area and high-aspect-ratio substrates.The currently strongly emerging ALD/MLD technique is uniquely suited to address the challenge in a scientifically elegant yet industrially feasible way. This technique is derived from the two parent gas-phase thin-film techniques: ALD for inorganic materials (mostly binary metal oxides, sulfides, and nitrides), [12][13][14] and its counterpart MLD for purely organic thin films (e.g., polyimides and polyamides). [15] In both cases, the attractive film growth characteristics are derived from the unique way of separating the different precursor gas pulses. Currently, ALD is the standard thin-film technology in many Atomic layer deposition (ALD) for high-quality conformal inorganic thin films is one of the cornerstones of modern microelectronics, while molecular layer deposition (MLD) is its less-exploited counterpart for purely organic thin films. Currently, the hybrid of these two techniques, i.e., ALD/MLD, is strongly emerging as a state-of-the-art gas-phase route for designer's metal-organic thin films, e.g., for the next-generation energy technologies. The ALD/MLD literature comprises nearly 300 original journal papers covering most of the alkali...

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Multistage laser shock improves surface structural properties of aluminum alloy

Zhang

Xia

Zhang

et al. 2023

International Journal of Mechanical Sciences

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In-situ multi-step pulsed vapor phase surface functionalization of zirconia nanoparticles via copper-free click chemistry

Cited by 6 publications

References 41 publications

About the importance of purge time in molecular layer deposition of alucone films

About the importance of purge time in molecular layer deposition of alucone films

Atomic/Molecular Layer Deposition for Designer's Functional Metal–Organic Materials

Multistage laser shock improves surface structural properties of aluminum alloy

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