In situ investigation of magnetron sputtering plasma used for the deposition of multiferroic BiFeO3 thin films

Gaidi, Mounir; Somrani, N.; Stafford, L.

doi:10.1007/s10854-017-7178-x

Cited by 5 publications

(2 citation statements)

References 17 publications

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“…In general, the reports in the literature focus on preparing thin film materials requiring an deposited surfaces such as LaAlO3, glass and amorphous silica substrates under encompassing various precursors routs [37][38][39][40] . For examples, the chemical vapor deposition 41,42 , pulsed laser deposition 43,44 , sputtering 45,46 , sol-gel process 47,48 and the polymeric 49,50 methods were employ to grow BiFeO3thin films. As displayed in Fig.…”

Section: Two Dimensional Nanostructuresmentioning

confidence: 99%

Recent advances in bismuth ferrite nanomaterials: Synthesis, characterization and application

2021

jcbsc

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Attracted materials nanostructures consist of bismuth ferrite strong attention to being a candidate optimistic in many applications due to perovskite structure as aspect of relevance to electronic structure and chemical bonding. This review article focuses on recent developments regarding the synthesis, characterization, and applications of BiFeO3 nanostructures.The synthesis of bismuth ferrite with different morphologies phases parameters as exhibits multi-ferroic properties of both ferroelectric ordering and antiferromagnetic ordering which is useful for applications in memory, spintronic photovoltaics and magneto-electric sensor devices. Based on account of advanced characteristics like electrical resistance, the multiferroic BiFeO3 nanomaterials are emerged to be a tough challenger in the several physiochemical research area in comparison to the other inorganic perovskites nanostructures.

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Section: Two Dimensional Nanostructuresmentioning

confidence: 99%

Recent advances in bismuth ferrite nanomaterials: Synthesis, characterization and application

2021

jcbsc

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“…Many different deposition methods have been used to grow BFO thin films including pulsed laser deposition [9,10], chemical vapor deposition [11,12], sputtering [13,14] and chemical solution deposition using the sol-gel process [15,16] or the polymeric precursor method [17,18]. The chemical solution deposition (CSD) consists in the deposition of a solution on a substrate, typically by dip or spin coating, followed by subsequent annealing treatments of the wet film in order to crystallize the desired material [19].…”

Section: Introductionmentioning

confidence: 99%