In-process optical characterization method for sub-100-nm nanostructures

Abstract

Optical measurements based on laser light scattering by nanostructures provide fast and contactless measurement of the surface of nanostructures for defects. In this paper, a novel in-process measurement method based on coherent laser light scattering by sub-100-nm structures is presented. It is shown that nanostructure defects can be identified by their unique scattering pattern. This is investigated by using modified algorithms of the discrete dipole approximation (DDA). Also hardware acceleration of the DDA algorithm on a General Purpose Graphical Processing Unit (GPGPU) platform shows a speedup of a factor of 5 over a high end CPU based platform.

Replication fidelity assessment of large area sub-μm structured polymer surfaces using scatterometry

“…confocal imaging, are very sensitive to vibrations, and a huge challenge, asisolation and damping from vibrations produced in an industrial environment is a difficult task [6]. Therefore new metrology methods will be needed to meet the requirements of emerging nanotechnologies based products [7,8]. For instance has scatterfield microscopy been demonstrated to extend the limits of image-based optical metrology [9].…”