2008
DOI: 10.4028/www.scientific.net/kem.388.23
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Impurity Contamination and Diffusion during Annealing in Implanted ZnO

Abstract: The effect of ion implantation leading to contamination and diffusion of lithium impurity in ZnO ceramics substrates was investigated. The diffusion coefficients of Li in the implanted ZnO annealed at 1000 and 850°C were in good agreement with those in the non-implanted ZnO. At 700°C, Li diffusion in the implanted ZnO was strongly enhanced. Our results show that the defects introduced by the implantation enhance the impurity diffusion at low temperature annealing.

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Cited by 5 publications
(7 citation statements)
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“…The effect of extra heat-treatment has been investigated when heat-treating the samples at 600°C, especially to initiate the diffusion of Li ions. A heat-treatment at this temperature ensures a high diffusion coefficient of Li in ZnO [21].…”
Section: Methodsmentioning
confidence: 99%
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“…The effect of extra heat-treatment has been investigated when heat-treating the samples at 600°C, especially to initiate the diffusion of Li ions. A heat-treatment at this temperature ensures a high diffusion coefficient of Li in ZnO [21].…”
Section: Methodsmentioning
confidence: 99%
“…We have undertaken heat treatment of ZnO:Li and ZnO:Li-Yb nanopowders at 600°C because it is known that the Li ions become mobile in ZnO crystalline network at this temperature [21]. On the other hand, a decrease in the intensity of Li-band may be due to a heat treatment induced condensation of Li ions into metallic Li droplets thus resulting in a decrease of the number of luminescent Li-Li nanoclusters.…”
Section: Effect Of Heat Treatment In Air On LI Luminescencementioning
confidence: 99%
“…The values of D b of Li in AlZnO were smaller than those in non-doped ZnO ceramics by a factor of about 0.2. In our previous study, 20) Li diffusion in non-doped ZnO was written as D Li ðcm 2 =sÞ ¼ 4:7  10 À2 exp½À243:5 ðkJ=molÞ= RT . The activation energy determined in this study is larger than that in the previous study 20) because of the effect of Al in ZnO.…”
Section: Resultsmentioning
confidence: 99%
“…In our previous study, 20) Li diffusion in non-doped ZnO was written as D Li ðcm 2 =sÞ ¼ 4:7  10 À2 exp½À243:5 ðkJ=molÞ= RT . The activation energy determined in this study is larger than that in the previous study 20) because of the effect of Al in ZnO. Moreover, it is pointed out here that the activation energy for Li diffusion in AlZnO is in good agreement with that for the oxygen self-diffusion in the same samples.…”
Section: Resultsmentioning
confidence: 99%
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