2014
DOI: 10.1021/am503949g
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Improvement of the SiOx Passivation Layer for High-Efficiency Si/PEDOT:PSS Heterojunction Solar Cells

Abstract: Interfacial properties currently hinder the performance of Si/organic heterojunction solar cells for an alternative to high-efficiency and low-cost photovoltaics. Here, we present a simple and repeatable wet oxidation method for developing the surface passivation layer, SiOx, on the Si surface for the fabrication of high-efficiency Si/poly(3,4-ethylene-dioxythiophene):polystyrenesulfonate (PEDOT:PSS) heterojunction solar cells. The uniform and dense SiOx thin layer introduced by the oxidizing aqueous solution … Show more

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Cited by 121 publications
(129 citation statements)
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References 27 publications
(56 reference statements)
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“…Finally, the samples were immersed in a diluted HF (5%) solution for 5 min to remove the native oxide to obtain H-Si surfaces. The cleaned Si were then transferred into a diluted HNO 3 (10%) solution to form a SiO x film to act as a passivation layer [25,26]. Highly conductive PED-OT:PSS (Clevios PH1000) uniformly mixed with 5 wt% DMSO and 1 wt% Triton X-100 was spin-coated onto the surface of the SiO x -terminated Si substrate at a spin speed of 1500 rpm in air for 60 s. Following that, the samples were annealed at 140°C for 10 min under nitrogen atmosphere.…”
Section: Methodsmentioning
confidence: 99%
“…Finally, the samples were immersed in a diluted HF (5%) solution for 5 min to remove the native oxide to obtain H-Si surfaces. The cleaned Si were then transferred into a diluted HNO 3 (10%) solution to form a SiO x film to act as a passivation layer [25,26]. Highly conductive PED-OT:PSS (Clevios PH1000) uniformly mixed with 5 wt% DMSO and 1 wt% Triton X-100 was spin-coated onto the surface of the SiO x -terminated Si substrate at a spin speed of 1500 rpm in air for 60 s. Following that, the samples were annealed at 140°C for 10 min under nitrogen atmosphere.…”
Section: Methodsmentioning
confidence: 99%
“…Their high thermal budget accounts for~30% of the total manufacturing cost of silicon (Si) solar cells [2]. To reduce the fabrication cost, the low-temperature solar cell concepts based on the organic/inorganic hybrid heterojunctions, particularly the Si/poly (3,4-ethylenedioxythiophene):-poly(styrenesulfonate) (Si/PEDOT:PSS), have attracted significant research interest in recent years [3][4][5][6]. Si has a strong absorption ability in a very wide spectrum range and very excellent carrier transport ability.…”
Section: Introductionmentioning
confidence: 99%
“…And PEDOT:PSS is a water-soluble polymer which has high conductivity, a transmission window in the visible spectral range, and an excellent chemical and thermal stability [7]. This type of Si/PEDOT:PSS hybrid solar cell combines the superior absorption property of Si in a wide spectrum range and the advantage of aqueous solution-based processes for PED-OT:PSS [4], which avoids an expensive high-temperature process and promises a low-cost photovoltaic technique with the potential to realize a power conversion efficiency (PCE) as high as 22% in theory [5].…”
Section: Introductionmentioning
confidence: 99%
“…Although the a-Si:H-based heterojunction with intrinsic thin-film technology has demonstrated high efficiency, an alternative material that inherently exhibits excellent surface passivation and proper band alignment is required. Therefore, in addition to a-Si:H, metal oxides such as AlO x [11][12][13], SiO 2 [14,15], and TiO 2 [16,17] have been used in constructing carrier selective barriers with passivation ability on crystalline Si to achieve a high photocurrent. Pudasaini et al [11] used ultrathin aluminum oxide (approximately 1.84 nm), grown through an atomic layer deposition, on an n-type Si wafer as a passivation layer in a poly (3,4-ethylenedioxythiophene) polystyrene sulfonate/Si hybrid heterojunction solar cell system.…”
Section: Introductionmentioning
confidence: 99%
“…Pudasaini et al [11] used ultrathin aluminum oxide (approximately 1.84 nm), grown through an atomic layer deposition, on an n-type Si wafer as a passivation layer in a poly (3,4-ethylenedioxythiophene) polystyrene sulfonate/Si hybrid heterojunction solar cell system. Sheng et al [14] used a wet method to form silicon oxide on a Si wafer as a passivation layer. A 10.48% efficiency was achieved in a hybrid solar cell.…”
Section: Introductionmentioning
confidence: 99%