“…Although the a-Si:H-based heterojunction with intrinsic thin-film technology has demonstrated high efficiency, an alternative material that inherently exhibits excellent surface passivation and proper band alignment is required. Therefore, in addition to a-Si:H, metal oxides such as AlO x [11][12][13], SiO 2 [14,15], and TiO 2 [16,17] have been used in constructing carrier selective barriers with passivation ability on crystalline Si to achieve a high photocurrent. Pudasaini et al [11] used ultrathin aluminum oxide (approximately 1.84 nm), grown through an atomic layer deposition, on an n-type Si wafer as a passivation layer in a poly (3,4-ethylenedioxythiophene) polystyrene sulfonate/Si hybrid heterojunction solar cell system.…”