A multipurpose mask set, consisting of three stepper reticles, contains 95% of all test structures required for CMOS process development and random defect detection. Reimizes the feedback loop for defect density data, parametric data and unit process data. crease dramatically, as would the number of test programs associated with these If, however, one standard Overall process, the adverse effects Of unit process opment would be minimized. alizing the mask set by two dozen standard unit processes min-process test mask set characterizes a'' levels Of the