2008
DOI: 10.1063/1.2906632
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Improvement of light extraction from GaN-based thin-film light-emitting diodes by patterning undoped GaN using modified laser lift-off

Abstract: To improve light extraction from GaN-based light-emitting diodes (LEDs), we demonstrated an approach of modified laser lift-off (M-LLO) technique for patterning undoped GaN (u-GaN). The M-LLO consists in sequentially forming a two-dimensional triangular lattice pattern with a 4μm period on a polymer layer over a sapphire substrate backplane by UV imprint and delivering the pattern onto u-GaN accompanied with the removal of the sapphire substrate. The enhancement of light extraction from GaN-based M-LLO LED wit… Show more

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Cited by 28 publications
(31 citation statements)
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References 15 publications
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“…The experimental data published in Ref. [18] also supports the strong dependence of light extraction efficiency on the grating depth. Sequential single variable optimization simply obtains a local maximum.…”
Section: Top and Bottom Grating Gan Led Simulation Resultssupporting
confidence: 65%
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“…The experimental data published in Ref. [18] also supports the strong dependence of light extraction efficiency on the grating depth. Sequential single variable optimization simply obtains a local maximum.…”
Section: Top and Bottom Grating Gan Led Simulation Resultssupporting
confidence: 65%
“…The technique etches the nanostructure onto u-GaN using a sapphire backplane, UV light, and a high power KrF laser. Peking University's (PKU) experiment varied the grating depths from 75nm to 120nm [18]. Imprint lithography, that can also produce similar air holes that measure 180nm in diameter, with a depth of 67nm, and a period of 295nm [19].…”
Section: (C) a Transmission Gratingmentioning
confidence: 99%
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