2010
DOI: 10.4071/isom-2010-tp2-paper1
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Improvement of ELK Reliability in Flip Chip Packages using Bond-on-Lead (BOL) Interconnect Structure

Abstract: In this paper, a novel flip chip interconnect structure called Bond-On-Lead (BOL) and its ability to reduce stress in the sensitive sub-surface ELK (Extra Low K) layers of the die is presented. BOL is a new low cost flip chip packaging solution which was developed by STATSChipPAC to dramatically reduce the cost of flip chip packaging. The BOL solution allows for efficient substrate routing by virtue of the use of narrow BOL pads and the removal of solder mask in the area of the BOL pads, which eliminates the l… Show more

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Cited by 16 publications
(4 citation statements)
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“…Prior characterizations on 65nm Low-K and lower Si nodes with ELK (Extra Low K-Dielectric) have shown the BoL structure as being more robust with respect to ILD crack protection vs. the comparable SMD joint configuration shown above. These findings have been proven by empirical data as well as the Finite Element Modeling (FEM) and have been reported extensively in prior papers [4], [5].…”
Section: Assembly Process Characterizationsupporting
confidence: 62%
“…Prior characterizations on 65nm Low-K and lower Si nodes with ELK (Extra Low K-Dielectric) have shown the BoL structure as being more robust with respect to ILD crack protection vs. the comparable SMD joint configuration shown above. These findings have been proven by empirical data as well as the Finite Element Modeling (FEM) and have been reported extensively in prior papers [4], [5].…”
Section: Assembly Process Characterizationsupporting
confidence: 62%
“…Prior work involving Thermo-Mechanical stress simulation on Cu-column on BOL structure has shown significant stress reduction on bump as well as on silicon dieelectric material (ELK) [4]. The same elements make CuBOL technology a superior one for Empirical data was generated using CuBOL technology on 28N/ELK TV; with 10x10mm sq.…”
Section: Application Of Cubol On Advanced Silicon Nodementioning
confidence: 99%
“…The robust margin seen with respect to ILD crack is partly due to the performance of fcCuBE achieved based on Cu column and BOL design, which has proven to increase the ILD crack process margin through both experimental data and modeling validation [8].…”
Section: Cu Column and Bol Design In Fccubementioning
confidence: 99%