2015
DOI: 10.1039/c5ra03301b
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Improved performance of a junctionless tunnel field effect transistor with a Si and SiGe heterostructure for ultra low power applications

Abstract: In this paper, we present improved device characteristics of a Junctionless Tunnel Field Effect Transistor (JLTFET) with a Si and SiGe heterostructure.

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Cited by 30 publications
(16 citation statements)
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“…In recent years, researchers have proposed several TFETs with distinct architectures and materials . Among them, III‐V TFETs attracted wide attention because of their high ON current and lower subthreshold swing values .…”
Section: Tfet Device Characteristics and Demonstration Of Significantmentioning
confidence: 99%
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“…In recent years, researchers have proposed several TFETs with distinct architectures and materials . Among them, III‐V TFETs attracted wide attention because of their high ON current and lower subthreshold swing values .…”
Section: Tfet Device Characteristics and Demonstration Of Significantmentioning
confidence: 99%
“…In recent years, researchers have proposed several TFETs with distinct architectures and materials. [5][6][7][8] Among them, III-V TFETs attracted wide attention because of their high ON current and lower subthreshold swing values. 7,8 In this work, a universal analytical double-gate InAs TFET Verilog-A model with channel length L = 20 nm has been explored for TFET circuit design.…”
Section: Device Structure and Modelsmentioning
confidence: 99%
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