2018
DOI: 10.1088/1361-6528/aabbb9
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Improved luminescence properties of MoS2 monolayers grown via MOCVD: role of pre-treatment and growth parameters

Abstract: Fabrication of transition metal dichalcogenides (TMDCs) via metalorganic chemical vapor deposition (MOCVD) represents one of the most attractive routes to large-scale 2D material layers. Although good homogeneity and electrical conductance have been reported recently, the relation between growth parameters and photoluminescence (PL) intensity-one of the most important parameters for optoelectronic applications-has not yet been discussed for MOCVD TMDCs. In this work, MoS is grown via MOCVD on sapphire (0001) s… Show more

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Cited by 25 publications
(29 citation statements)
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“…High-quality TMDs and their lateral heterostructures including metallic NbS 2 /semiconducting WS 2 have been successfully synthesized on a large scale by chemical vapor deposition (CVD). There are three CVD approaches for growing TMDs, namely, (i) solid-metal-precursor, , (ii) vapor-metal-precursor, and (iii) liquid-metal-precursor approaches. ,, Solid-metal-precursor CVD provides high-quality TMDs with crystal domains of a few tens of μm in size; however, sample uniformity is often limited by the growth conditions. The vapor-metal-precursor approach, with metal–organic CVD as an example, provides a uniformly distributed sample on a 4 in. wafer, but the grown TMD suffers from low crystallinity (a few hundred nm domain) and low accessibility due to its toxicity .…”
mentioning
confidence: 99%
“…High-quality TMDs and their lateral heterostructures including metallic NbS 2 /semiconducting WS 2 have been successfully synthesized on a large scale by chemical vapor deposition (CVD). There are three CVD approaches for growing TMDs, namely, (i) solid-metal-precursor, , (ii) vapor-metal-precursor, and (iii) liquid-metal-precursor approaches. ,, Solid-metal-precursor CVD provides high-quality TMDs with crystal domains of a few tens of μm in size; however, sample uniformity is often limited by the growth conditions. The vapor-metal-precursor approach, with metal–organic CVD as an example, provides a uniformly distributed sample on a 4 in. wafer, but the grown TMD suffers from low crystallinity (a few hundred nm domain) and low accessibility due to its toxicity .…”
mentioning
confidence: 99%
“…Therefore, hardware implementation of PNNs using Gaussian synapses will necessitate large-area growth of MoS 2 and BP. Fortunately, recent years have seen tremendous progress in wafer-scale growth of high quality MoS 2 and BP using chemical vapor deposition (CVD) and metal organic chemical vapor deposition (MOCVD) techniques 3741 . Furthermore, while we have used two different 2D materials, MoS 2 and BP, for our demonstration of Gaussian synapses owing to their superior performance as n-type and p-type FETs, respectively, there are 2D materials, such as, WSe 2 , which offer ambipolar transport, i.e., the presence of both electron and hole conduction 42 and can be grown over large area using CVD techniques 43 .…”
Section: Resultsmentioning
confidence: 99%
“…[ 1–3 ] Some 2D materials show also exceptional topological features, allowing pairs of electrons to travel without resistance along specific paths. [ 4,5 ] These characteristics can be exploited not only in nanoelectronics, but also in a large number of other applications, like sensing, [ 6–8 ] optoelectronics [ 6,9,10 ] and energy storage. [ 11–16 ]…”
Section: Introductionmentioning
confidence: 99%
“…[27] CVD starting from MoO 3 and S precursors can be used to grow high-quality MoS 2 heterostructures on several substrates in a scalable way. [9,[28][29][30][31][32][33] Controlling the size, shape, and number of layers of MoS 2 is possible by changing the growth parameters of the CVD reactor; [34] however, the growth depends critically on the interaction with the substrate and a full understanding of this process is still lacking.…”
Section: Introductionmentioning
confidence: 99%
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