1973 International Electron Devices Meeting 1973
DOI: 10.1109/iedm.1973.188766
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Improved fabrication and noise performance of silicon double-drift millimeter-wave IMPATT diodes

Abstract: Silicon doubledrift IMPATT diodes with both drift regions implanted into A (undoped) epi on p+ substrates are discussed. By incorporating doublycharged ions, frequency coverage has been extended down to 40 GHz.The A epitaxial material was characterized by spreading resistance measurements so that the ions were implanted into a completely defined host material lattice. RF test results a t 55 GHz comparing single-and doubledrift diodes are given. Noise figure measurements show that the transition from small-to l… Show more

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“…The last was chosen since it represents the most controllable technique. 4 Because IMPATT diodes display a negative-admittance characteristic over a wide frequency range, three doping profile designs were adequate to provide oscillators covering the WT4 frequency range. These doping profiles provide devices with overlapping frequency bands.…”
Section: Avalanche-drift Regionmentioning
confidence: 99%
“…The last was chosen since it represents the most controllable technique. 4 Because IMPATT diodes display a negative-admittance characteristic over a wide frequency range, three doping profile designs were adequate to provide oscillators covering the WT4 frequency range. These doping profiles provide devices with overlapping frequency bands.…”
Section: Avalanche-drift Regionmentioning
confidence: 99%