Improved design of 5 nm class electron optical microcolumn for manufacturing convenience and its characteristics

Oh, Tae-Sik; Kim, Daewook; Ahn, Seungjoon; Kim, Ho Seob

doi:10.1116/1.4815953

Cited by 9 publications

(6 citation statements)

References 17 publications

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“…Recently, a very high resolution microcolumn optics (M-50) has been proposed. 14,15) The improved ∼5 nm class electron optical microcolumns have been designed so that the microcolumn can be assembled through relatively convenient manufacturing processes considering the ultimate application to multiple microcolumn arrays. An advantage of the improved design is that it can mitigate the complexities in manufacturing processes by simply enlarging the aperture diameter of an extractor electrode and inserting an additional subsidiary electrode.…”

Section: Microcolumn Opticsmentioning

confidence: 99%

“…An advantage of the improved design is that it can mitigate the complexities in manufacturing processes by simply enlarging the aperture diameter of an extractor electrode and inserting an additional subsidiary electrode. 14) Another advanced design of an ultraminiaturized column (U-50 model) is also proposed by eliminating the Einzel lens without affecting the performance. 15) The schematic diagrams of these two models are shown in Fig.…”

Section: Microcolumn Opticsmentioning

confidence: 99%

“…1. (Color online) Microcolumn structures of (a) conventional model, (b) advanced model M-50,14) and (c) model U-50 15).…”

mentioning

confidence: 99%

“…2. (Color online) (a) Variations of probe current and probe beam size, and (b) variation of E2 focusing voltage depending on the S2 or S2s voltage.A negative voltage is applied to the S2 electrode for the conventional model (R-5), and to the S2s electrode for the M-50 model 14).…”

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confidence: 99%

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Development of arrayed microcolumns and field emitters

Kim

Lee

Choi

et al. 2017

Jpn. J. Appl. Phys.

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Electron beam devices have been widely used for inspection or lithography processes. The multibeam technology based on arrayed microcolumns has been developed to overcome the low throughput issue. However, the multicolumn system has some drawbacks such as complexity, electron optics, and electron source. The first drawback is the difficulty in multicolumn assembly. In particular, the alignment process of a source lens and a tip requires sophisticated techniques. The second drawback is that the e-beam characteristics of microcolumns constituting the multicolumn differ from column to column. To solve the first drawback, a sub-5-nm-resolution probe beam optic design with a simple structure and a two-dimensional carbon nanotube (2D-CNT) electron emitter instead of the widely used tungsten field emitter tip have been studied.

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Section: Microcolumn Opticsmentioning

confidence: 99%

Section: Microcolumn Opticsmentioning

confidence: 99%

“…1. (Color online) Microcolumn structures of (a) conventional model, (b) advanced model M-50,14) and (c) model U-50 15).…”

mentioning

confidence: 99%

mentioning

confidence: 99%

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Development of arrayed microcolumns and field emitters

Kim

Lee

Choi

et al. 2017

Jpn. J. Appl. Phys.

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show abstract

“…However, for high-power devices, many challenges should be overcome with the cold cathode electron source. For the market penetration of high-power devices such as X-ray lamps, [6][7][8][9][10][11] the structure modification process, [12][13][14] visible lightbulb, 15,16) micro-columns 17) and UV lamps, 18,19) we need a triode structure [20][21][22][23] electron beam with CNT emitters as the electron sources. The cold cathode electron beam requires an electron extraction gate mesh electrode.…”

Section: Introductionmentioning

confidence: 99%

The effect of gate mesh electrode strain on performance of cold cathode electron beam

Kang¹,

Yoo²,

Ihm³

et al. 2019

Jpn. J. Appl. Phys.

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The effect of an electron extraction electrode on electron emission was studied, in particular, the effect of the strain of a gate electrode for high-performance cold cathode electron beam fabrication. For the cold cathode electron beam with carbon nanotube emitters, the structure of a gate grid mesh electrode was one of the most important components. Gate current through the grid mesh was a serious hurdle to be overcome. When gate current is high, the electron emission current could be saturated, even if the gate bias is increased. To overcome this phenomenon, the structure of the gate electrode was optimized. By using a lower strain gate mesh structure with low-cost SUS304 material, we could reduce the gate current ratio from 17% to 8.4%. Finally, we could increase the electron emission current from 0.6 to 2.3 mA and current density from 40 to 202 mA cm−2, with a gate mesh with 77 μm strain in 1.5 N weight load.

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Design of an ultra-miniaturized electron optical microcolumn with sub-5 nm very high resolution

Kim

Ahn

et al. 2014

Ultramicroscopy

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Improved design of 5 nm class electron optical microcolumn for manufacturing convenience and its characteristics

Cited by 9 publications

References 17 publications

Development of arrayed microcolumns and field emitters

Development of arrayed microcolumns and field emitters

The effect of gate mesh electrode strain on performance of cold cathode electron beam

Design of an ultra-miniaturized electron optical microcolumn with sub-5 nm very high resolution

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