Imprinted polymer stamps for UV-NIL

Haatainen, Tomi; Mäkelä, Tapio; Ahopelto, Jouni; Kawaguchi, Yasuhide

doi:10.1016/j.mee.2009.04.020

Cited by 16 publications

(5 citation statements)

References 9 publications

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“…Over the past 16 years, a variety of NIL processes has been developed, concerning different types of substrates, resist materials and molding processes. Semi‐continuous and continuous imprinting techniques, such as step‐and‐repeat imprint lithography (step‐and‐stamp IL146, 147 for thermal resists, step‐and‐flash IL143 for UV resists) and R2R NIL148 have been invented for an increased throughput. Nonflat surfaces can be patterned with rigiflex molds125 and reverse NIL (rNIL) 149, 150.…”

Section: Nanoimprint Lithographymentioning

confidence: 99%

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

et al. 2011

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Section: Nanoimprint Lithographymentioning

confidence: 99%

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

et al. 2011

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“…Haatainen et al demonstrated the fabrication of the F-template by combining the fluorinated mold material and thermal step and stamp nanoimprint lithography (SSIL) method, as well as presented imprinted results using the F-template. The patterns including gratings with 50 nm features and dot arrays of 350 nm diameter features have been achieved [59].…”

Section: Others Fluoropolymer Materialsmentioning

confidence: 99%

Soft UV Nanoimprint Lithography and Its Applications

Lan¹

2013

Updates in Advanced Lithography

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Additional information is available at the end of the chapter http://dx.doi.org/10.5772/56186 . IntroductionLarμe-area nanopatterninμ tecνnoloμy νas demonstrated νiμν potential wνicν can siμniλi-cantly enνance tνe perλormance oλ many devices and products, sucν as LEDs, solar cells, νard disk drives, laser diodes, display, etc [ ]. For example, nano-patterned sappνire substrates NPSS and pνotonic crystals PνC νave been considered as tνe most eλλective approacνes to improve tνe liμνt output eλλiciency internal quantum eλλiciency and external quantum eλλiciency oλ LEDs and beam sνapinμ [ , ]. Tνe solar cells witν sub-micro anti-reλlective coatinμ exνibited νiμνer pνotocurrent and νiμνer power conversion eλλiciency compared to tνose witνout nanostructures [ ]. Moreover, tνe ability to produce larμe-area micro-and nanostructures on non-planar surλaces is oλ importance λor many applications sucν as optics, optoelectronics, nanopνotonics, imaμinμ tecνnoloμy, NEMS, and microλluidics [ ]. However, creatinμ larμe-area nanostructures on curved or non-planar surλaces are extremely diλλicult usinμ existinμ patterninμ approacνes. Furtνermore, a variety oλ existinμ nanopatterninμ tecνnoloμies sucν as electron beam litνoμrapνy EL" , optical litνoμrapνy, interλerence litνoμrapνy IL , etc., cannot cope witν all tνe practical demands oλ industrial applications witν respect to νiμν resolution, νiμν tνrouμνput, low cost, larμe area, and patterninμ on nonλlat and curved surλace. Tνereλore, new νiμν volume nanomanuλacturinμ tecνnoloμy stronμly needs to be exploited and developed so as to meet tνe tremendous requires oλ rapid μrowinμ markets.Nanoimprint litνoμrapνy NIL νas now been considered as a promisinμ nanopatterninμ metνod witν low cost, νiμν tνrouμνput and νiμν resolution, especially λor producinμ tνe larμe-area micro/nano scale patterns and complex -D structures and as well as νiμν-aspect-ratio λeatures. Due to tνese outstandinμ advantaμes, it was accepted by International Tecνnoloμy Roadmap λor Semiconductors ITRS in λor tνe and nm nodes, scνeduled λor industrial manuλacturinμ in . Tosνiba νas validated NIL λor nm and beyond. NIL νas also been listed as one oλ emerμinμ tecνnoloμies tνat will stronμly impact tνe world by Compared to otνer NIL processes tνermal NIL or νot embossinμ, UV-NIL witν riμid mold and nanopatterninμ metνods, soλt UV-NIL usinμ a λlexible or soλt mold νas been proven to be a very promisinμ approacν λor makinμ larμe-area patterns up to waλer-level in tνe micrometer and nanometer scale, λabricatinμ -D micro/nano structures and νiμν-aspect-ratio λeatures, especially producinμ larμe-area patterns on tνe non-planar surλaces even curved substrates at low-cost and witν νiμν tνrouμνput. Since tνe soλt mold stamp, template is adopted, tνe soλt UV-NIL process νas some unique advantaμes compared witν tνe traditional UV-NIL witν riμid mold. Tνese strenμtνs include Cost reduction. Cνeap soλt molds can be easily replicated λrom one expensive master, siμniλicantly reducinμ cost oλ tνe master template λabrication.Conλorma...

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“…A lot of NIL processes were developed over the past 15 years, concerning different types of substrates, resist materials and molding processes. Continuous imprinting techniques, such as step-and-repeat imprint lithography (step-and-stamp IL , for thermal resists, step-and-flash IL , for UV resists) and roll-to-roll NIL have been invented for an increased throughput. Nonflat surfaces can be patterned with rigiflex molds or reverse NIL (rNIL). , Small and large features can be patterned by hybrid solutions combining NIL and conventional photolithography (combined nanoimprint- and photolithography; CNP …”

Section: Introductionmentioning

confidence: 99%

Double-Layer Imprint Lithography on Wafers and Foils from the Submicrometer to the Millimeter Scale

Moonen

Yakimets

Makk

et al. 2011

ACS Appl. Mater. Interfaces

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In this paper, a thermal imprint technique, double-layer nanoimprint lithography (dlNIL), is introduced, allowing complete filling of features in the dimensional range of submicrometer to millimeter. The imprinting and filling quality of dlNIL was studied on Si substrates as a model system and compared to results obtained with regular NIL (NIL) and reverse NIL (rNIL). Wavy foils were imprinted with NIL, rNIL and dlNIL and the patterning results compared and discussed. With dlNIL, a new application possibility was introduced in which two different resists having, for example, a different etch resistance to a certain plasma were combined within one imprint step. dlNIL allows extension to many resist combinations for tailored nanostructure fabrication.

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Imprinted polymer stamps for UV-NIL

Cited by 16 publications

References 9 publications

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

Soft UV Nanoimprint Lithography and Its Applications

Double-Layer Imprint Lithography on Wafers and Foils from the Submicrometer to the Millimeter Scale

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