Double-Layer Imprint Lithography on Wafers and Foils from the Submicrometer to the Millimeter Scale

Moonen, P.; Yakimets, Iryna; Makk, Péter; Meinders, Erwin R.; Huskens, Jurriaan

doi:10.1021/am101187n

Cited by 6 publications

(5 citation statements)

References 29 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Small and large features can be patterned by hybrid solutions combining NIL and conventional photolithography (combined nanoimprint‐ and photolithography; CNP) 151. Simultaneous thermal imprinting from the sub‐micrometer to millimeter scale on foils is given by double‐layer NIL (dlNIL) 152…”

Section: Nanoimprint Lithographymentioning

confidence: 99%

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

et al. 2011

View full text Add to dashboard Cite

show abstract

Section: Nanoimprint Lithographymentioning

confidence: 99%

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

et al. 2011

View full text Add to dashboard Cite

show abstract

“…Most conventional methods, such as electron beam (e-beam) lithography and x-ray lithography, can produce nanoscale structures [6] but inherent low throughput has been a major problem in beam-based lithography. Nanoimprint lithography addresses the need for low-cost, high-resolution, large-area production and high throughput manufacturing [7], but it still needs a stamp mold manufactured by means of the ebeam. Nanosphere lithography and nanoporous aluminium oxide membranes have been demonstrated as an efficient way to produce nanoscale patterns over a large area with high throughput and low-cost, but long-range order is still not achieved.…”

Section: Introductionmentioning

confidence: 99%

Controllable fabrication of periodic arrays of high-aspect-ratio micro-nano hierarchical structures and their superhydrophobicity

Jiang

et al. 2013

J. Micromech. Microeng.

View full text Add to dashboard Cite

This paper demonstrates a flexible and controllable fabrication of vertically aligned and high-aspect-ratio (HAR) micro-nano hierarchical structures using conventional micro-technologies. We first masked the nanopatterns on a photoresist mold by shifting the same photomask, which could be performed using conventional contact microlithography. Thereby replicating nanopatterns onto an aluminium mold and successfully fabricating silicon nanopillar arrays about 300 nm in diameter and 5 μm in height via the deep reactive etching (DRIE) process. We also fabricated micro-nano hierarchical structures with variable aspect ratios using the proposed nanopattern technology and DRIE process without using any special nanopatterning equipment or techniques. The proposed method not only simplified the fabrication process but also produced HAR (higher than 15) structures. We also investigate the replica molding steps from the fabricated silicon stamp to a UV-curable polymer replica using a PDMS mold and conventional nano-imprinting, where each nanopillar diameter was 320 nm with 95% fidelity. As a result, the hierarchical structure arrays show stable superhydrophobic surface properties with a contact angle of approximately 160 • . Owing to the cost efficiency of mass production and the fidelity of the strategy, the methodology could provide a general approach for fabricating complex three-dimensional periodic hierarchical structures onto a single chip and can be applied to various fields of multifunctional applications.

show abstract

“…This tendency has been sustained over the past several decades on the basis of continuing advancements in manufacturing technologies including optical lithography 2–5. However, photolithography is reaching a physical limit in resolution,3, 6, 7 and thus alternative technologies such as extreme ultraviolet (EUV) lithography, nanoimprint lithography, interference lithography, and directed self‐assembly (DSA) are emerging rapidly 2, 3, 8–16. DSA of block copolymers (BCPs) has recently attracted much attention as a promising candidate for next‐generation lithography due to its capacity to provide excellent resolution and scalability 3, 17–25.…”

mentioning

confidence: 99%

Multi‐Pathway Excited State Relaxation of Adenine Oligomers in Aqueous Solution: A Joint Theoretical and Experimental Study

Bányász

Gustavsson

Onidas

et al. 2013

Chemistry A European J

136

View full text Add to dashboard Cite

The singlet excited states of adenine oligomers, model systems widely used for the understanding of the interaction of ultraviolet radiation with DNA, are investigated by fluorescence spectroscopy and time-dependent (TD) DFT calculations. Fluorescence decays, fluorescence anisotropy decays, and time-resolved fluorescence spectra are recorded from the femtosecond to the nanosecond timescales for single strand (dA)20 in aqueous solution. These experimental observations and, in particular, the comparison of the fluorescence behavior upon UVC and UVA excitation allow the identification of various types of electronic transitions with different energy and polarization. Calculations performed for up to five stacked 9-methyladenines, taking into account the solvent, show that different excited states are responsible for the absorption in the UVC and UVA spectral domains. Independently of the number of bases, bright excitons may evolve toward two types of excited dimers having π-π* or charge-transfer character, each one distinguished by its own geometry and spectroscopic signature. According to the picture arising from the joint experimental and theoretical investigation, UVC-induced fluorescence contains contribution from 1) exciton states with a different degree of localization, decaying within a few ps, 2) "neutral" excited dimers decaying on the sub-nanosecond timescale, being the dominant species, and 3) charge-transfer states decaying on the nanosecond timescale. The majority of the photons emitted upon UVA excitation are related to charge-transfer states.

show abstract

Double-Layer Imprint Lithography on Wafers and Foils from the Submicrometer to the Millimeter Scale

Cited by 6 publications

References 29 publications

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

Influence of growing system on nitrate accumulation in two varieties of lettuce and red radicchio of Treviso

Controllable fabrication of periodic arrays of high-aspect-ratio micro-nano hierarchical structures and their superhydrophobicity

Multi‐Pathway Excited State Relaxation of Adenine Oligomers in Aqueous Solution: A Joint Theoretical and Experimental Study

Contact Info

Product

Resources

About