2006
DOI: 10.1109/tns.2006.885374
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Impact of Heavy-Ion Strikes on Minimum-Size MOSFETs With Ultra-Thin Gate Oxide

Abstract: In this work we have investigated the effects of irradiation and electrical stress of nanocrystal memory cell arrays. Heavy ion irradiation has no or negligible immediate effects on the nanocrystal MOSFET characteristics, and on the programming window of the cells. By electrically stressing irradiated device, we see accelerated oxide breakdown similar to that previously observed on conventional thin gate oxide MOS capacitors, but no appreciable change of the degradation kinetics in terms of programming window … Show more

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Cited by 21 publications
(20 citation statements)
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References 21 publications
(23 reference statements)
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“…The conclusions here are different from those in [12] (no upsets in 45 nm), due to the different architecture of the tested PCM cells -μtrench vs wall -which strongly impact the size of the region that needs to be amorphized to get an upset.…”
Section: Discussioncontrasting
confidence: 89%
See 3 more Smart Citations
“…The conclusions here are different from those in [12] (no upsets in 45 nm), due to the different architecture of the tested PCM cells -μtrench vs wall -which strongly impact the size of the region that needs to be amorphized to get an upset.…”
Section: Discussioncontrasting
confidence: 89%
“…In [12], using a combination of published and reasonable values for a(0) 2 and g, the numbers shown in Fig. 9 were obtained.…”
Section: Discussionmentioning
confidence: 94%
See 2 more Smart Citations
“…Microdose effects, observed for instance in low-voltage and Power MOSFETs [14][15], are not expected to be a concern either. In fact, phase change cells are known to withstand very high doses and sensitivity is not expected to grow with scaling.…”
Section: A Physical Mechanismsmentioning
confidence: 99%