2010
DOI: 10.1063/1.3374890
|View full text |Cite
|
Sign up to set email alerts
|

Impact of defect distribution on transport properties for Au/ZnO Schottky contacts formed with H2O2-treated unintentionally doped n-type ZnO epilayers

Abstract: The Au/ZnO Schottky contacts fabricated using H2O2-treated unintentionally doped ZnO epilayers showed an abnormal behavior in their transport properties; i.e., the background carrier density-dependent trade-off relation between the barrier height and the ideality factor was observed. This result is attributed to the difference in carrier transport mechanisms for each sample fabricated using ZnO epilayers with different background carrier concentrations; namely, the observed trade-off relation originates from a… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

1
8
0

Year Published

2011
2011
2019
2019

Publication Types

Select...
9
1

Relationship

1
9

Authors

Journals

citations
Cited by 26 publications
(9 citation statements)
references
References 18 publications
1
8
0
Order By: Relevance
“…1. It is clear that the diodes grown on the sol-gel seed layer demonstrate a rather leaky characteristic, similar to an ohmic behavior; this result is similar to the reported nonsurface-treated Au/ZnO Schottky diodes [10], [19]. In contrast, a very good rectifying characteristic is revealed in the diodes grown on the hydrothermal seed layer, which demonstrates a rectification ratio as large as 8000 at bias voltages of ±2 V. The rectification ratio is even better than that of the Au/bulk-ZnO Schottky diodes with an oxygen plasma-treated ZnO surface [10].…”
Section: Resultssupporting
confidence: 73%
“…1. It is clear that the diodes grown on the sol-gel seed layer demonstrate a rather leaky characteristic, similar to an ohmic behavior; this result is similar to the reported nonsurface-treated Au/ZnO Schottky diodes [10], [19]. In contrast, a very good rectifying characteristic is revealed in the diodes grown on the hydrothermal seed layer, which demonstrates a rectification ratio as large as 8000 at bias voltages of ±2 V. The rectification ratio is even better than that of the Au/bulk-ZnO Schottky diodes with an oxygen plasma-treated ZnO surface [10].…”
Section: Resultssupporting
confidence: 73%
“…For the ZnO/TC-SLG Schottky PD, ϕ B and η were determined to be 0.61 eV and 1.16, respectively, at 300 K. In Schottky diodes, the low η manifested a clean interface between metal and semiconductor for the device, resulting in a dominance of thermionic emission rather than recombination [42]. One possible reason could be an effective removal of chemical residues from the SLG surface through the thermal cleaning process.…”
Section: Resultsmentioning
confidence: 99%
“…The noble metals with large work function such as Pt, Au, Ag, and Pd have been used for a Schottky contact on ZnO, 2,3 and the barrier height is not correlated with the obvious difference in the work functions. Recent reports claimed that the performance of Schottky contacts on ZnO bulk wafers were improved by various surface treatments, such as O 2 and/or O 2 /He plasma irradiation, 4 sulfide treatment, 5 UV ozone cleaning, 6 boiling H 2 O 2 treatment, 3,[7][8][9][10] and surface etching by using solutions of hydrochloric, 11 phosphoric, 12 and nitric acids, 13 before forming a Schottky contact with a metal. Surface treatment with the boiling H 2 O 2 was particularly effective in reducing the leakage current of the diode and the deep level emission photoluminescence signal: effects that were predicted by Chia-Hung Tsai et al 9 in terms of the passivation of donor behavior point defects at the surface of ZnO and a formation of an interface oxide layer.…”
Section: Introductionmentioning
confidence: 99%