2009
DOI: 10.1063/1.3267856
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Impact of base size and shape on formation control of multifaceted InP nanopyramids by selective area metal organic vapor phase epitaxy

Abstract: Articles you may be interested inHeteroepitaxy of InP on Si(001) by selective-area metal organic vapor-phase epitaxy in sub-50nm width trenches: The role of the nucleation layer and the recess engineering InGaAs heterostructure formation in catalyst-free GaAs nanopillars by selective-area metal-organic vapor phase epitaxy Appl. Phys. Lett. 97, 243102 (2010); 10.1063/1.3526734 Mid-infrared emission from InAs quantum dots, wells, and dots on well nanostructures grown on InP (100) by metal organic vapor phase epi… Show more

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Cited by 11 publications
(12 citation statements)
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“…Several studies report the formation of high-index facets during MOVPE growth of III-V nanostructures, 8,20 which can considerably affect the growth result. In Sec.…”
Section: Introductionmentioning
confidence: 99%
“…Several studies report the formation of high-index facets during MOVPE growth of III-V nanostructures, 8,20 which can considerably affect the growth result. In Sec.…”
Section: Introductionmentioning
confidence: 99%
“…2 (c and d). In general, the truncated InP pyramids exhibit a top surface close to (100) bound by four {110} and {111} side facets [9]. For the D2.5 pyramids, the top surface is bend with a valley in the center due to growth rate enhancement close to the side walls, which is not observed for the D1.8 pyramids when the extension of the top surface area is smaller than the adatom migration length [10,11].…”
Section: Methodsmentioning
confidence: 97%
“…However, the performance is still not optimal due to the dispersion in size of the self-assembled InGaAs QDs, giving rise to inhomogeneous broadening of the gain spectrum. Recent work has used the growth of QDs on the tops of pyramids formed using selective-area growth [102] to improve the control of QD size; however, this is necessarily an expensive process.…”
Section: Advantages Of Nanotechnologymentioning
confidence: 99%