2016
DOI: 10.1109/ted.2015.2498923
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III–V Nanowire Transistors for Low-Power Logic Applications: A Review and Outlook

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Cited by 53 publications
(32 citation statements)
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“…Devices were fabricated starting from wurtzite n‐type InAs NWs grown on (111)B InAs substrates ( Figure a) exploiting gold‐catalyzed chemical beam epitaxy (see the Supporting Information and the Experimental Section for further details). NWs were mechanically detached from the growth substrate by means of sonication and dispersed in isopropyl alcohol (IPA) before being transferred to a prepatterned p ++ Si/SiO 2 substrate by dropcasting (see the Supporting Information for further details). Combs of contact electrodes (100 nm wide) were patterned using electron‐beam lithography on selected InAs NWs, while square gate electrodes (100 µm side, yellow‐colored in Figure b) were defined in proximity of the contacted NWs.…”
Section: Resultsmentioning
confidence: 99%
“…Devices were fabricated starting from wurtzite n‐type InAs NWs grown on (111)B InAs substrates ( Figure a) exploiting gold‐catalyzed chemical beam epitaxy (see the Supporting Information and the Experimental Section for further details). NWs were mechanically detached from the growth substrate by means of sonication and dispersed in isopropyl alcohol (IPA) before being transferred to a prepatterned p ++ Si/SiO 2 substrate by dropcasting (see the Supporting Information for further details). Combs of contact electrodes (100 nm wide) were patterned using electron‐beam lithography on selected InAs NWs, while square gate electrodes (100 µm side, yellow‐colored in Figure b) were defined in proximity of the contacted NWs.…”
Section: Resultsmentioning
confidence: 99%
“…III–V semiconducting nanowires, specifically those with heterostructure configurations, are drawing attention due to their unique properties promising for electronic and optoelectronic applications such as transistors, solar cells, and photodetectors . The InAs–GaSb heterostructure system is particularly suitable for various tunneling‐based device applications such as tunneling field effect transistors (TFETs) and diodes due to the broken bandgap alignment it exhibits .…”
Section: Introductionmentioning
confidence: 99%
“…Due to significantly higher bulk electron and hole mobilities, III-V materials such as In 0.53 Ga 0.47 As and the group IV material germanium, respectively, have been suggested as a replacement for silicon as the channel material in advanced complimentary metal-oxidesemiconductor (CMOS) fabrication processes. Other III-V materials such as InAs NWs have also attracted considerable interests for their potential in high-performance applications in optoelectronics [2], as well as low-power logic applications [3]. Notwithstanding the technological challenges of replacing silicon in conventional semiconductor manufacturing, there is comparatively little known about the electronic structure of these replacement materials when patterned or grown in nanowires structures with diameters of the order of a few nanometer.…”
Section: Introductionmentioning
confidence: 99%
“…The effective masses can be considered in a first approximation as indicating the relative electron mobility for nanowires of different crystallographic orientation with a smaller effective mass suggesting higher electron mobilityassuming a similar order of magnitude in various electron relaxation processes between the various III-V nanowires examined. On the other hand, a small effective mass is concomitant with a lower density of states (DoS) leading to a lower inversion charge density [3] for device applications. Lower inversion charge density and phenomena such as band-to-band tunneling (BTBT) can severely limit device performance for transistors operating in a ballistic regime [22,25].…”
mentioning
confidence: 99%