2017
DOI: 10.3762/bjnano.8.198
|View full text |Cite
|
Sign up to set email alerts
|

Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

Abstract: In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the experimental characterization of the chemical interactions that occur at the interface built between different chemical guiding patterns and the domains of the block copolymers. We have chosen hard X-ray high kinet… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
7
0

Year Published

2018
2018
2023
2023

Publication Types

Select...
7

Relationship

3
4

Authors

Journals

citations
Cited by 7 publications
(7 citation statements)
references
References 38 publications
0
7
0
Order By: Relevance
“…(See supplemental information, figure S1). Surface characterization of the brush layer reveals an increased affinity of the brush layer with respect to PMMA when it is exposed to oxygen plasma 30 and, under mild oxygen plasma conditions, a very low damage (See the AFM characterization of the chemically functionalized guiding patterns in the supplemental information, figure S1).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…(See supplemental information, figure S1). Surface characterization of the brush layer reveals an increased affinity of the brush layer with respect to PMMA when it is exposed to oxygen plasma 30 and, under mild oxygen plasma conditions, a very low damage (See the AFM characterization of the chemically functionalized guiding patterns in the supplemental information, figure S1).…”
Section: Resultsmentioning
confidence: 99%
“…The most significant parameters are of dimensional nature (BCP film thickness, D, and guiding pattern dimensions), materials related (number of statistical segments per diblock copolymer, N, the statistical segment length, b, and the Flory-Huggins parameter, ) and process related (annealing temperature, solvent material, solution concentration and interface boundary energies). In addition to the here-referred parameters, the chemical interactions that take place between each domain of the BCP and the patterned surface (guiding and background stripes) is of prime importance as the main driving force in DSA by chemical epitaxy 30 . These interactions, in turn, are related to the difference of surface free energies of each copolymer domain and the confining boundary, Δ = SA -SB.…”
Section: Introductionmentioning
confidence: 99%
“…Chemoepitaxy involves the creation of dense chemical patterns on a neutral substrate to generate preferential wetting sites for one of the blocks [ 57 ]. Multiple processes and techniques have been successfully used to selectively tune the surface free energy of a neutral surface, including photolithography [ 58 ], electron-beam lithography (EBL) and oxygen plasma functionalization [ 59 , 60 , 61 , 62 , 63 ], direct EBL exposure [ 64 ] and scanning-probe lithography [ 65 , 66 , 67 ].…”
Section: Principles Of the Dsa Of Block Copolymersmentioning
confidence: 99%
“…Colloidal assembly is one of important routes to manufacture products with great diversities and functionalities in various applications, such as photonic crystals [1,2], soft lithography templates [3], and anti-reflection film [4]. There are ways of acquiring desired structures by colloidal assembly based on electrical controlling [5], optical trapping [6], capillarity [7], and chemical modification [8]. The final macroscopic structures assembled from colloidal particles by these methods greatly depends on the dynamic driving forces.…”
Section: Introductionmentioning
confidence: 99%