ID16B: a hard X-ray nanoprobe beamline at the ESRF for nano-analysis

Abstract

Within the framework of the ESRF Phase I Upgrade Programme, a new stateof-the-art synchrotron beamline ID16B has been recently developed for hard X-ray nano-analysis. The construction of ID16B was driven by research areas with major scientific and societal impact such as nanotechnology, earth and environmental sciences, and bio-medical research. Based on a canted undulator source, this long beamline provides hard X-ray nanobeams optimized mainly for spectroscopic applications, including the combination of X-ray fluorescence, X-ray diffraction, X-ray excited optical luminescence, X-ray absorption spectroscopy and 2D/3D X-ray imaging techniques. Its end-station re-uses part of the apparatus of the earlier ID22 beamline, while improving and enlarging the spectroscopic capabilities: for example, the experimental arrangement offers improved lateral spatial resolution ($ 50 nm), a larger and more flexible capability for in situ experiments, and monochromatic nanobeams tunable over a wider energy range which now includes the hard X-ray regime (5-70 keV). This paper describes the characteristics of this new facility, short-term technical developments and the first scientific results.

Point defects, compositional fluctuations, and secondary phases in non-stoichiometric kesterites

“…beam. The nanoXRF measurements were performed at station ID16B of the European Synchrotron -ESRF [120] with a beam spot size of approximately 50 nm and an x-ray energy of 29.34 keV. The latter enables the excitation of the fluorescence K lines of all elements of interest, including Sn.…”

Simulated sample heating from a nanofocused X-ray beam

“…Hard condensed matter is generally much less sensitive to radiation damage, although recent reports indicate, for instance, X-ray induced reduction of metal ions (Stanley et al, 2014). Driven by the need for higher spatial resolution, an increasing number of synchrotron beamlines with nanofocusing capabilities have recently become available (Tamasaku et al, 2001;Riekel et al, 2010;Schroer et al, 2010;Winarski et al, 2012;Johansson et al, 2013;de Jonge et al, 2014;Nazaretski et al, 2015;Salditt et al, 2015;Somogyi et al, 2015;Martínez-Criado et al, 2016). The next years will see further enhancements in both flux and focusing.…”

Maskless X-Ray Writing of Electrical Devices on a Superconducting Oxide with Nanometer Resolution and Online Process Monitoring

“…To facilitate the location of the region to be patterned by the X-ray nano-beam, two Pt pillars were deposited on the sapphire substrate close to the crystals by Focused Ion Beam (FIB)-assisted chemical vapour deposition. In order to monitor on-line the X-ray patterning process, at the ESRF ID16B beamline 24 the chip for electrical characterization was mounted on a customized sample holder allowing in situ four-probe electrical measurements (see Fig. 1a and also Materials and Methods section).

Figure 1( a ) Photograph of the experimental setup employed at the ESRF ID16B beamline showing the alignment optical microscope, the XRF detectors and the sample rotation stage around the z -axis of the laboratory reference frame.

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“…The X-ray nanopatterning procedure was performed at the long canted beamline ID16B 24 at the European Synchrotron Radiation Facility (ESRF) in Grenoble, France. The primary beamline optics (double white mirror and double crystal monochromator) are placed as close as possible to the in-vacuum undulator source to preserve the coherence of the beam, while the nanofocusing optics (Kirkpatrick-Baez mirrors) are located at 165 m, very close to the sample (~0.1 m) to obtain a higher degree of demagnification.…”