2000
DOI: 10.1143/jjap.39.4521
|View full text |Cite
|
Sign up to set email alerts
|

I–V Characteristics of Schottky/Metal-Insulator-Semiconductor Diodes with Tunnel Thin Barriers

Abstract: Current–voltage (I–V) characteristics and their temperature dependence, of Schottky and metal-insulator-semiconductor diodes with tunnel thin insulating layers, are theoretically and experimentally studied. The effective barrier height of a Schottky diode becomes low and strongly dependent upon the applied voltage, when the impurity density of the semiconductor increases such that the tunnel current dominates the total curent. The I–V curves and their temperature dependence, of the tunnel thin MIS diodes str… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
11
0

Year Published

2002
2002
2019
2019

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 13 publications
(11 citation statements)
references
References 6 publications
0
11
0
Order By: Relevance
“…The alternative gate structure is the metal-insulator-semiconductor (MIS) to reduce the gate leakage current and to overcome the SCE [3], [4]. The advantages of the MIS gate structure are as follows: 1) high-speed operation due to downsizing the device more and more; 2) possibility of single power supply due to enhancement mode operation; 3) possibility of complementary device structure; 4) improvement of thermal property and breakdown voltage.…”
mentioning
confidence: 99%
“…The alternative gate structure is the metal-insulator-semiconductor (MIS) to reduce the gate leakage current and to overcome the SCE [3], [4]. The advantages of the MIS gate structure are as follows: 1) high-speed operation due to downsizing the device more and more; 2) possibility of single power supply due to enhancement mode operation; 3) possibility of complementary device structure; 4) improvement of thermal property and breakdown voltage.…”
mentioning
confidence: 99%
“…8. The reverse current of the short-time oxidized sample is large and the currentvoltage characteristics look like that of an ohmic contact due to the high doping concentration (3 Â 10 18 /cc) of the epitaxial layer as theoretically demonstrated by Sugimura et al 8) But the leakage current is suppressed by the long oxidation. The current suppression vs oxide layer thickness is shown in Fig.…”
Section: Oxidation Nitridation and Oxi-nitridation Of Inalas (Photolmentioning
confidence: 79%
“…However, due to the large electron affinity of most metal oxide semiconductors only a small Schottky barrier is possible 310 , although Chasin et al have successfully demonstrated Schottky diodes using a-IGZO with a Pd contact 368 , as has Zhang et al with an Al contact 369 . Additionally, metal-insulator-semiconductor (MIS) 370 , Metal-insulator-metal (MIM) 371 and self-switching diodes (SSD) [372][373][374] have been demonstrated, but each has limitations that currently restrict them to academic interest rather than practical application. The most efficient and most common arrangement for rectifying circuitry is the bridge rectifier shown in figure 17.…”
Section: Energy Harvestingmentioning
confidence: 99%