2013
DOI: 10.1021/ph400031x
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M-Plane GaN/InAlN Multiple Quantum Wells in Core–Shell Wire Structure for UV Emission

Abstract: We report on the epitaxial growth of high-quality core−shell nonpolar m-plane GaN/InAlN multiple quantum wells (MQWs) on the sidewall facets of c-oriented hexagonal GaN wires. Pseudomorphic growth without generation of threading dislocations has been established for planar GaN/InAlN (In = 15%) MQWs grown on m-GaN substrates, although m-plane InAlN epilayers cannot be grown perfectly lattice-matched to GaN along the two in-plane directions. Calculations based on elasticity theory indicate that the significant a… Show more

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Cited by 47 publications
(69 citation statements)
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“…27 It has also been observed in other Al-containing hexagonal nanowire structures. [40][41][42] The proxigram defined in the ROI #2 for an Al 21% isosurface is displayed in Fig. 2(e), and shows that these Al segregation planes contain up to 40% Al atomic concentration, with an interface defined over about 2 nm.…”
mentioning
confidence: 99%
“…27 It has also been observed in other Al-containing hexagonal nanowire structures. [40][41][42] The proxigram defined in the ROI #2 for an Al 21% isosurface is displayed in Fig. 2(e), and shows that these Al segregation planes contain up to 40% Al atomic concentration, with an interface defined over about 2 nm.…”
mentioning
confidence: 99%
“…[1]. Для оптоэлектронных приложений структуры типа ННК GaAs в оболочке AlGaAs имеют значительный потенциал в связи с наличием широ-козонного покрывающего слоя, эффективно подавляющего процессы безызлучательной рекомбинации, связанные с высокой плотностью поверхностных состояний в ННК GaAs [2][3][4]. Кроме того, подобная геометрия ННК открывает новые возможности инженерии электрон-ной структуры в радиальных гетероструктурах [5,6].…”
Section: поступило в редакцию 28 сентября 2016 гunclassified
“…1 Engineering the band gap of AlN, GaN and InN finds different applications in the semiconducting industry for their various optoelectronic properties such as photovoltaic, hydrogen storage, light and field emissions. [2][3][4][5][6] Because of the capability to create two-dimensional electron gas at the hetero-junctions, the III-nitrides are used for developing high electron mobility transistors along with the hetero-junction field effect transistors and bipolar transistors. 7 III-nitride based photonic device is also used as ultraviolet (UV)-blue light emissions.…”
Section: Introductionmentioning
confidence: 99%
“…7 III-nitride based photonic device is also used as ultraviolet (UV)-blue light emissions. 2,8 Among all the III-nitrides, AlGaN is very important because of its applications in high power and high mobility electronic devices. 9,10 The major advantages of the AlGaN alloys are its compatibility of tuning the direct band gap in between the energy ranges from 3.47 to 6.2 eV.…”
Section: Introductionmentioning
confidence: 99%
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