In situSTM study of the electrodeposition and anodic dissolution of ultrathin epitaxial Ni films on Au(111)

Electrodeposition of Co and Ni/Au(111) ultrathin layers. Part I: nucleation and growth mechanisms from in situ STM

“…Experimentally significant cobalt deposition, i.e. significant cobalt dissolution, was observed if E D < À1:20 V. Nickel could be deposited at potentials closer to E 0 Ni in agreement with previous reports [18]. The deposition yield was q $ 0:16 and 0.6 for cobalt and nickel respectively.…”

“…The above electrochemical model was recently re-examined in light of in situ quartz crystal microbalance (QCMB) measurements, which showed that the deposition rate is greater at submonolayer coverage than in the multilayer deposition regime [17]. Several detailed in situ STM studies have been published about nickel deposition [18]. Only preliminary studies concerned cobalt deposition on Au(1 1 1) [6] and on Au(1 0 0) and Au(1 1 1) from a solution different from the one used in this work [19].…”

Growth and characterization of Au, Ni and Au–Ni nanoclusters on 6H-SiC(0001) carbon nanomesh

“…Several factors such as particle size variation and other changes on the surface may cause the slight decay of Ni 2p peak. Previous STM studies have demonstrated that deposition of Ni on Au(111) at room temperature would result in exchange between Ni adatoms and Au surface atoms, which is known as the place exchange process [56][57][58]. The Ni atoms nucleating on Au clusters may also go through such a process, leading to a slight attenuation of Ni 2p peak [31].…”

Diffusion-limited electrodeposition of ultrathin Au films on Pt(111)

“…In recent years modern structure sensitive in situ techniques such as scanning tunneling microscopy (STM) or atomic force microscopy (AFM) have greatly contributed to the understanding of these growth processes on the atomic scale. For instance, the initial stages of the deposition of thin magnetic films were investigated this way [2][3][4][5]. Unlike gas phase metal deposition, e.g., via molecular beam epitaxy (MBE), fundamental studies of the electrodeposition of ultrathin metal films are often performed under conditions close to equilibrium, where the thickness and morphology of the resulting film are controlled by the thermodynamic properties of the respective system.…”