2007
DOI: 10.1116/1.2734163
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In situ spectroscopic ellipsometry to monitor surface plasmon resonant group-III metals deposited by molecular beam epitaxy

Abstract: Articles you may be interested inMeasuring the localized surface plasmon resonance effect on large arrays (5mm × 5mm) of gold and aluminum nanoparticles on borosilicate glass substrates, fabricated by electron beam lithography

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Cited by 31 publications
(43 citation statements)
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“…31,63 Real-time monitoring of this process was performed by in situ spectroscopic ellipsometry (SE) from λ 0 = 200À820 nm at a 20°g razing angle of incidence, permitting the termination of growth when the desired optical properties were attained ( Figure 1E). 6,30 Samples were stored in ambient atmosphere for 21 months prior to the CL measurements, demonstrating the robustness of the native oxide shell.…”
Section: Methodsmentioning
confidence: 99%
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“…31,63 Real-time monitoring of this process was performed by in situ spectroscopic ellipsometry (SE) from λ 0 = 200À820 nm at a 20°g razing angle of incidence, permitting the termination of growth when the desired optical properties were attained ( Figure 1E). 6,30 Samples were stored in ambient atmosphere for 21 months prior to the CL measurements, demonstrating the robustness of the native oxide shell.…”
Section: Methodsmentioning
confidence: 99%
“…6,30 The experimentally measured ellipsometric parameters Δ and ψ were converted to a pseudodielectric function following the method described previously. 6,24 The initial pseudodielectric function closely matches the response of crystalline silicon ( Figure 1E, green lines).…”
mentioning
confidence: 99%
“…20,[24][25][26]29,30,46 The samples were subsequently measured more extensively ex situ with a J. A. Woollam Co., Inc. VASE system to collect angle-and energy-resolved VAMM and scattering spectra.…”
Section: Acs Photonicsmentioning
confidence: 99%
“…25−30 Specifically, this technique has been used to demonstrate the correlation between mean NP size and the inplane and out-of-plane localized surface plasmon resonance (LSPR) modes of substrate-supported Ga NPs. 20,29,30 This approach allows the operator to tune the plasmon resonance to a desired wavelength on any substrate, providing real-time feedback for fabricating structures optimized for plasmonic applications such as UV-SERS, 31,32 but a deeper analysis is needed to reveal how the measured plasmon resonance frequencies and widths of self-assembled NP ensembles relate to the mean NP size and spatial distribution, respectively. This problem is exacerbated by the fact that LSPRs depend also on the substrate and inter-NP interactions.…”
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confidence: 99%
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