2020
DOI: 10.1088/1361-6463/ab761c
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In situ characterization of Fischer–Tropsch catalysts: a review

Abstract: In the field of heterogeneous catalysis research, in situ and operando characterization techniques, i.e. characterization techniques which can be applied under realistic reaction conditions and ideally on a working catalyst, become essential in order to generate new knowledge and understanding of structure performance relationships. Only this knowledge will enable researchers to develop or rather design new catalysts for existing and novel processes without relying on an ‘educated guess’ approach. In combinati… Show more

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Cited by 34 publications
(40 citation statements)
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References 234 publications
(541 reference statements)
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“…The area ratio of L 3 /L 2 is estimated to be 0.79, which is in agreement with the reported experimental value of 0.8 for Ti 4+ [48,50]. L 2 (and L 3 ) edges are further split into two peaks due to the crystal field interaction, where Ti-O octahedron splits the degenerate Ti 3d states into two states of t 2g and e g [51,52]. The energy separation of peaks A1 and A2 is 5.3 eV, indicates the oxidation state of Ti is +4 again [51].…”
Section: Resultssupporting
confidence: 89%
“…The area ratio of L 3 /L 2 is estimated to be 0.79, which is in agreement with the reported experimental value of 0.8 for Ti 4+ [48,50]. L 2 (and L 3 ) edges are further split into two peaks due to the crystal field interaction, where Ti-O octahedron splits the degenerate Ti 3d states into two states of t 2g and e g [51,52]. The energy separation of peaks A1 and A2 is 5.3 eV, indicates the oxidation state of Ti is +4 again [51].…”
Section: Resultssupporting
confidence: 89%
“…Furthermore, the wide size distribution of this spent sample shows the presence of a few particles that are in the range of 20-70 nm. This particle growth can be attributed to the combination of the high H 2 O concentration and the high reaction temperatures reached, which has also been reported for other metal-based catalysts [32].…”
Section: Ex Situ Pxrd and Temsupporting
confidence: 72%
“…Few models have been developed on stress relaxation on patterned heteroepitaxial films where it was shown that the patterned film as well as the patterned substrate has a large effect on relaxation of the film stress. [22][23][24][25] Hu's model showed that due to having free edges the patterned film on the substrate releases film stress through the edges. While the model of Fischer and Richter [24] showed that if the substrate is patterned it can release more stress of the patterned film.…”
Section: Resultsmentioning
confidence: 99%
“…[22][23][24][25] Hu's model showed that due to having free edges the patterned film on the substrate releases film stress through the edges. While the model of Fischer and Richter [24] showed that if the substrate is patterned it can release more stress of the patterned film. In our work, the stress distribution of the patterned GaN and underlying patterned silicon substrate also showed the similar results shown in Figure 5.…”
Section: Resultsmentioning
confidence: 99%