Hydrogen–argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel

Härkönen, Emma; Potts, Stephen E.; Kessels, W.M.M.; Díaz, Belén; Seyeux, Antoine; Światowska, Jolanta; Maurice, Vincent; Marcus, Philippe; Radnóczi, G.; Tóth, Lajos; Kariniemi, Maarit; Niinistö, Jaakko; Ritala, Mikko

doi:10.1016/j.tsf.2013.03.022

Cited by 25 publications

(28 citation statements)

References 47 publications

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“…Correlation between the OH residual level and porosity of the coating has been proposed in previous studies on other substrates. 26,40 The present data also point out a correlation between OH residual level and densification of the coating as revealed by the variation of sputtering rate.…”

Section: Resultssupporting

confidence: 75%

Electrochemical and Surface Analysis of the Corrosion Protection of Copper by Nanometer-Thick Alumina Coatings Prepared by Atomic Layer Deposition

Mirhashemihaghighi

Światowska

Maurice

et al. 2015

J. Electrochem. Soc.

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Corrosion protection by ultra-thin (≤ 50 nm) alumina films deposited by atomic layer deposition (ALD) on copper at 250 • C was studied in 0.5 M NaCl aqueous solution by combining electrochemical and surface analytical methods. Time-of-Flight Secondary Ion Mass Spectrometry revealed a homogenous in-depth stoichiometry of the alumina coatings and their residual bulk contamination by organic and water precursor fragments. Trace contamination by a spurious Cu oxide was evidenced at the interface with the Cu substrate despite a reducing pre-treatment. Atomic force microscopy images revealed conformal substrate coverage and a granularlike coating morphology at the nanometer scale. Linear Sweep Voltammetry (LSV) and Electrochemical Impedance Spectroscopy (EIS) showed no electrochemical activity of the coating and a corrosion decrease reaching 4 orders of magnitude for coated samples in comparison with bare copper. Uncoated surface fraction was quantified by application of three different methods using the LSV and EIS data which led to results in excellent agreement. The uncoated surface fraction for 50 nm Al 2 O 3 layers was ∼0.01%, confirming ALD alumina as an excellent coating for corrosion protection with spectacularly low residual corrosion activity restricted to the bottom of channel defects connecting the substrate to environment through the coating.Copper is an important engineering metal and finds widespread application in heat exchangers, electrical power lines, water utilities, oil refineries, marine environments and microelectronics owing to its high electrical and thermal conductivity and mechanical workability. 1-3 Many studies have been dedicated to the copper corrosion mechanisms, especially in presence of aggressive ions like chloride, 4-8 and various corrosion protection methods have been explored including coating techniques such as Chemical Vapor Deposition (CVD), 9,10 plasma deposition 11 or electrochemical polymerization, 12 and the use of inhibitors 13-16 or self-assembled monolayers. 17,18 In the present study, Atomic Layer Deposition (ALD) of ultra-thin (≤ 50 nm) alumina coatings has been investigated for the corrosion protection of copper. ALD, as a CVD derived method, is an ideal technique for growing high quality nanometer-thick films. It takes advantage of sequential precursor pulsing on the substrate with selflimiting saturative steps to produce conformal films with accurate thickness control. As a result of excellent step-coverage on even difficult substrate surfaces with high aspect ratios, the grown films tend to be conformal and pinhole-free. [19][20][21][22] Alumina (Al 2 O 3 ) was chosen as a well-behaved and thoroughly-studied ALD material by virtue of its high dielectric properties, good adhesion to many surfaces, amorphous structure, thermal stability and mechanical properties. 21,23-25 ALD alumina for corrosion protection has already been studied alone and/or in combination with titania on stainless steel, 23,26-28 Mg alloy, 29 Al alloy, 30 silver 31,32 and copper. 33-36 Nanolamina...

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Section: Resultssupporting

confidence: 75%

Electrochemical and Surface Analysis of the Corrosion Protection of Copper by Nanometer-Thick Alumina Coatings Prepared by Atomic Layer Deposition

Mirhashemihaghighi

Światowska

Maurice

et al. 2015

J. Electrochem. Soc.

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“…This is probably a porous interfacial oxide layer containing iron (mostly) and chromium oxide species as shown by the time‐of‐flight secondary ion mass spectrometry (TOF‐SIMS) data discussed below. Oxidized interface layers have been observed previously with ALD‐coated steels 22–27, 34…”

Section: Resultssupporting

confidence: 52%

“…Promising results were obtained, especially with the laminate coatings. Recently the corrosion protection abilities of thinner ALD and plasma‐enhanced (PE)ALD coatings have been studied 20–34. The electrochemical barrier properties of <100 nm thick coatings were found comparable to micrometer‐thick coatings prepared by other methods.…”

Section: Introductionmentioning

confidence: 96%

“…Corrosion protection by ALD has gained increasing attention during the last few years 19–34. Already in 1999 Matero et al19 considered ALD Al 2 O 3 , TiO 2 , Ta 2 O 5 , and Al 2 O 3 /TiO 2 laminates with thicknesses ranging from 170 to 500 nm for protecting stainless steel.…”

Section: Introductionmentioning

confidence: 99%

“…A slight increase in Al 2 O 3 stability could be achieved by “cleaning” the steel surface with plasma pre‐treatment prior to coating. Hydrocarbon impurities were removed thus improving the nucleation and overall barrier properties of the coatings 34. In addition, Al 2 O 3 /Ta 2 O 5 laminate coatings were prepared to combine the good sealing properties of Al 2 O 3 with the chemical stability of Ta 2 O 5 26.…”

Section: Introductionmentioning

confidence: 99%

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Al_xTa_yO_z Mixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steel

Härkönen¹,

Díaz²,

Światowska³

et al. 2013

Chemical Vapor Deposition

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Atomic layer deposited (ALD) 50 nm Al x Ta y O z mixture coatings are grown on steel for corrosion protection. In morphological and compositional analyses the coatings are found to be uniform, conformal, well-adhered, and low in defect density. Corrosion protection properties are evaluated with polarization measurements and neutral salt spray (NSS) testing. The sealing properties of the mixtures improve with increasing aluminum oxide content, whereas the protection durability improves with increasing tantalum oxide content. In comparison to single-layer and nano-laminate ALD Al 2 O 3 and Ta 2 O 5 coatings, all mixtures are found to have better protective properties.

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The Inorganic Film Coatings for Corrosion Protection

Pehkonen¹,

Yuan²

2018

Interface Science and Technology

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Hydrogen–argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel

Cited by 25 publications

References 47 publications

Electrochemical and Surface Analysis of the Corrosion Protection of Copper by Nanometer-Thick Alumina Coatings Prepared by Atomic Layer Deposition

Electrochemical and Surface Analysis of the Corrosion Protection of Copper by Nanometer-Thick Alumina Coatings Prepared by Atomic Layer Deposition

Al_xTa_yO_z Mixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steel

The Inorganic Film Coatings for Corrosion Protection

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Hydrogen–argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel

Cited by 25 publications

References 47 publications

Electrochemical and Surface Analysis of the Corrosion Protection of Copper by Nanometer-Thick Alumina Coatings Prepared by Atomic Layer Deposition

Electrochemical and Surface Analysis of the Corrosion Protection of Copper by Nanometer-Thick Alumina Coatings Prepared by Atomic Layer Deposition

AlxTayOz Mixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steel

The Inorganic Film Coatings for Corrosion Protection

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Al_xTa_yO_z Mixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steel