1997
DOI: 10.1109/2944.640630
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Hydride vapor phase epitaxy revisited

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Cited by 68 publications
(46 citation statements)
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“…HVPE [8] domain structures, has the advantage of rapid growth under near-equilibrium conditions. Rapid growth presents the possibility of very thick OP-GaAs structures (up to 1 mm), which are necessary because the pump laser is incident on the side of the layer.…”
Section: Introductionmentioning
confidence: 99%
“…HVPE [8] domain structures, has the advantage of rapid growth under near-equilibrium conditions. Rapid growth presents the possibility of very thick OP-GaAs structures (up to 1 mm), which are necessary because the pump laser is incident on the side of the layer.…”
Section: Introductionmentioning
confidence: 99%
“…It seems that hydrate vapor phase epitaxy 14 (HVPE) is the preferred growth method but liquid phase epitaxy 15 (LPE) may also be a plausible technique. The contemplated fabrication sequence is illustrated in Fig.…”
Section: What Do We Need From the Crystal Grower?mentioning
confidence: 99%
“…Finally, the regrowth should not result in appearance of crystal growth artifacts (e.g., "rabbit ears") near the mesa (or pillar) edges [36]. HVPE is a technique that can meet all these demands [37].…”
Section: Epitaxial Regrowthmentioning
confidence: 99%