Hybrid lithography approach for single mode polymeric waveguides and out-of-plane coupling mirrors

Weyers, David; Mistry, Akash; Nieweglowski, Krzysztof; Bock, Karlheinz

doi:10.1109/ectc51906.2022.00301

Cited by 8 publications

(10 citation statements)

References 15 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…By ordering this premixed in syringes directly from micro resist technology, we were both able to solve problems with small bubbles after spin coating and achieve good control over applied amount of resin by using a pneumatic dispenser. Before applying the resin O 2 -plasma activation is performed for best adhesion [11]. Undiluted resin and a spin speed of yielding 3000 RPM a thickness of µ was derived from planarization tests on 27 m 6 m µ topography from pads and RDL on Si-interposer, that will be explained later in the characterization chapter.…”

Section: A Uv-lithographymentioning

confidence: 99%

“…Since the path of beam through the mirror is very short, small differences in absorption only have a minor impact, thus the patterning conformity, process stability and mechanical stability are the most important aspects. To ensure the later, adhesion tests similar to those for optical RDL in [11] were carried out on the contact interfaces of the µ-mirrors: Si, SiO 2 and bottom clad.…”

Section: Min 2 Minmentioning

confidence: 99%

“…The capability of polymer waveguides (WG) to provide interposer and module level interconnects has been largely demonstrated [5]- [10]. In [11] we proposed a combination of polymer WGs patterned in to an optical RDL via UV-lithography and µ-mirrors structured with 2PP-DLW to provide surface coupling. With the combination of two processes that we termed hybrid lithography we combine the advantages of both.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Hybrid Lithography Fabrication of Single Mode Optics for Signal Redistribution and Coupling

Weyers,

Nieweglowski,

Bock

2024

IMAPSource Proceedings

View full text Add to dashboard Cite

This paper describes advances in hybrid-lithography process, combining UV-lithography for planar, single mode redistribution layer (RDL) and 2-photon- polymerization direct-laserwriting (2PP-DLW) for micro-mirrors inside RDL-opening. Improvements to multi-layer direct patterning of OrmoCore/-Clad material system using UV- ithography and need for broadband UV-LED source are presented. Near square core cross sections and smooth sidewalls are achieved. Openings in full stack with steep sidewalls without residual layer are patterned. To optimize 2PP-DLW-process processing window for both OrmoComp and IP-DIP is thoroughly characterized. Roughness measurements prove feasibility even of coarsely printed structure as reflective μ-mirror for 1550 nm wavelength. Finally these results are applied to periscope probe for wafer-level-testing of edge emitting lasers and proof of concept is shown. Outlook to further research on UV-lithography of multi-layer waveguide stack and alignment with μ-mirror printing is given.

show abstract

Section: A Uv-lithographymentioning

confidence: 99%

Section: Min 2 Minmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Hybrid Lithography Fabrication of Single Mode Optics for Signal Redistribution and Coupling

Weyers,

Nieweglowski,

Bock

2024

IMAPSource Proceedings

View full text Add to dashboard Cite

show abstract

“…[201][202][203][204] The generally studied silicate materials is the ORMOCER ® (Organic Modified Ceramic), which has been applied in numerous photonic applications, and also as a scaffold for cell growth and biomolecule immobilization applications. [205][206][207][208][209] Combining silicon alkoxides with monomers and other metal alkoxides makes the modification of the material properties possible for specific TPL applications, such as the silicon-zirconium hybrid SZ2080™, which is a transparent, biocompatible, and mechanically stable hybrid that can be used for complex 3D structures without shrinkage (Figure 3f). [119,[210][211][212][213][214][215][216] So far, different variants of silicon-zirconium composites have been investigated.…”

Section: Metallic Containing Materialsmentioning

confidence: 99%

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Wang

Zhang

Ladika

et al. 2023

Adv Funct Materials

View full text Add to dashboard Cite

The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced three-dimensional printing techniques, two-photon polymerization lithography (TPL) uniquely offers a significant electron microscope (SEM) images of SMP structures before and after programming and after recovery, respectively. Reproduced under terms of the CC-BY license. [114] Copyright 2021, The Authors, published by Nature Publishing Group. b) Stiff SMPs for high-resolution reversible nanophotonics. I-II) The deformed and recovered nanopillars under optical microscope and SEM, respectively. Reproduced with permission. [115] Copyright 2022, American Chemical Society. c) Vapor-responsive photonic arrays. I-IV) Optical image of a grid array in air, in water vapors ~ 20 s, saturation with water vapors ~ 88s, and after the gas flow stopped, respectively.Reproduced under terms of the CC-BY license. [116] Copyright 2021, The Authors, published by Royal Society of Chemistry. d) SEM image of a 40-layer face-cantered-cubic photonic structure printed by SU-8. Reproduced with permission. [117] Copyright 2004, Nature Publishing Group. e) SEM image of helices with an axial pitch of 800 nm and a radius of 800 nm fabricated by the two-step absorption photoresist. Reproduced with permission. [118]

show abstract

“…Optical cables have already demonstrated potential for long-distance communications. Additionally, a previous study [3] highlighted the application of single-mode waveguides (SM-WGs) for short-distance communications at the interposer level, utilizing a hybrid-lithography approach that combines UV-lithography and 2PP-DLW processes to fabricate SM-WGs with micromirrors for out-of-plane communication. However, the slow nature of the 2PP-DLW process makes mass production of micro-mirrors challenging without advancements in processing tools.…”

Section: Introductionmentioning

confidence: 99%

Integration of Multi-Lithography Technologies for the Fabrication of Flexible Optical Link

Mistry,

Nieweglowski,

Bock

2024

IMAPSource Proceedings

View full text Add to dashboard Cite

The advancement in demand for high bandwidth energy-efficient communication in the data centre and edge cloud servers needs a viable optical interconnection solution to cope with the demands. Therefore, the presented study describes the concept of flexible multi-mode waveguides (MMWGs) as an optical link for co-packaged optics. It evaluates three lithography technologies; UV-lithography, 2 photon polymerization direct laser writing process (2PP-DLW), and nano-imprint lithography (NIL) for the fabrication of flexible MM-WGs. The UV-lithography and 2PP-DLW process were evaluated for the fabrication of MM-WGs and micro-mirrors, respectively, for the master pattern of the NIL stamp. The NIL evaluates the imprinting of the MM-WGs with micro-mirrors at either end on the flexible and transparent PEN substrates with a low-loss OrmoClad lower cladding layer. There are five different crosssections from 10x10 μm2 to 50x50 μm2 of MM-WGs with micromirrors were imprinted. Additionally, it presents the importance of integrating multi-lithography technologies to fabricate flexible optical links where a 2PP-DLW process shows the best results for printing μm-scale optical components. On the other side, UV-lithography with SU-8 gives the foremost definition of the master for the polymeric MM-WGs. Furthermore, NIL offers the industrial mass-production option alongside prototyping.

show abstract

Hybrid lithography approach for single mode polymeric waveguides and out-of-plane coupling mirrors

Cited by 8 publications

References 15 publications

Hybrid Lithography Fabrication of Single Mode Optics for Signal Redistribution and Coupling

Hybrid Lithography Fabrication of Single Mode Optics for Signal Redistribution and Coupling

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Integration of Multi-Lithography Technologies for the Fabrication of Flexible Optical Link

Contact Info

Product

Resources

About