HPPMS deposition from composite targets: Effect of two orders of magnitude target power density changes on the composition of sputtered Cr-Al-C thin films

Rueß, Holger; Baben, Moritz to; Mráz, Stanislav; Shang, Lin; Polcik, P.; Kolozsvári, S.; Hans, Marcus; Primetzhofer, Daniel; Schneider, Jochen M.

doi:10.1016/j.vacuum.2017.08.048

Cited by 21 publications

(26 citation statements)

References 29 publications

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“…The unknown peak at 26° in the Cr 2 AlC bulk target is absent in the coatings’ patterns obtained after annealing. The presence of chromium carbide in XRD results indicates that the coatings’ composition somewhat differs from the target, resulting from preferred aluminum resputtering during the deposition process [ 34 ]. Moreover, the Cr-Al-C phase diagram confirms the coexistence of intermediate phases (AlC 2 , Cr 7 C 3 , Cr 3 C 2 ) with Cr 2 AlC MAX phase if the stoichiometric ratio of Cr/Al/C deviates from 2:1:1 [ 20 , 42 ].…”

Section: Resultsmentioning

confidence: 99%

“…This ratio increases with the increase in average power in HiPIMS. The observed Cr/Al ratio in the annealed specimen is slightly higher than that of as-deposited coatings in each case, indicating that the deposited Cr and Al are depleted owing to high ionization in HiPIMS or preferred aluminum resputtering during the deposition process [ 34 ]. Moreover, Al loss is more significant in the annealed coating, which indicates that the Al is diffused out from the coating surface during the ex situ annealing because the 650 °C annealing temperature nearly equals the melting point of Al or vaporized into the furnace environment during the high vacuum annealing process.…”

Section: Resultsmentioning

confidence: 99%

“…Fu et al [ 33 ] studied the oxidation and corrosion behavior of Ti 2 AlC MAX films deposited through HiPIMS on the stainless-steel substrate. However, the application of HiPIMS in MAX phase thin film deposition has been limited so far [ 34 , 35 , 36 ]. The study on the influence of deposition parameters on film microstructure and properties is lacking.…”

Section: Introductionmentioning

confidence: 99%

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Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Qureshi

Tang

et al. 2021

Materials

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The high-power impulse magnetron sputtering (HiPIMS) technique is widely used owing to the high degree of ionization and the ability to synthesize high-quality coatings with a dense structure and smooth morphology. However, limited efforts have been made in the deposition of MAX phase coatings through HiPIMS compared with direct current magnetron sputtering (DCMS), and tailoring of the coatings’ properties by process parameters such as pulse width and frequency is lacking. In this study, the Cr2AlC MAX phase coatings are deposited through HiPIMS on network structured TiBw/Ti6Al4V composite. A comparative study was made to investigate the effect of average power by varying frequency (1.2–1.6 kHz) and pulse width (20–60 μμs) on the deposition rate, microstructure, crystal orientation, and current waveforms of Cr2AlC MAX phase coatings. X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) were used to characterize the deposited coatings. The influence of pulse width was more profound than the frequency in increasing the average power of HiPIMS. The XRD results showed that ex situ annealing converted amorphous Cr-Al-C coatings into polycrystalline Cr2AlC MAX phase. It was noticed that the deposition rate, gas temperature, and roughness of Cr2AlC coatings depend on the average power, and the deposition rate increased from 16.5 to 56.3 nm/min. Moreover, the Cr2AlC MAX phase coatings produced by HiPIMS exhibits the improved hardness and modulus of 19.7 GPa and 286 GPa, with excellent fracture toughness and wear resistance because of dense and column-free morphology as the main characteristic.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Qureshi

Tang

et al. 2021

Materials

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“…The evaporation of A-elements is a general phenomenon in MAX-phase growth and even more pronounced for elements with higher vapor pressures (e.g., Al and In). 65 This implies that growth of Ti3SiC2 from a compound source is restricted to a certain temperature range to avoid Si evaporation and the on-set for growth of phases with a lower Si content such as Ti4SiC3 and Ti7Si2C5 with 12.5 at% and 14.3 at% Si, respectively.…”

Section: Sputtering Power [W]mentioning

confidence: 99%

Compositional dependence of epitaxial Tin+1SiCn MAX-phase thin films grown from a Ti3SiC2 compound target

Magnuson

Tengdelius

Greczyński

et al. 2019

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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The authors investigate sputtering of a Ti 3 SiC 2 compound target at temperatures ranging from RT (no applied external heating) to 970°C as well as the influence of the sputtering power at 850°C for the deposition of Ti 3 SiC 2 films on Al 2 O 3 (0001) substrates. Elemental composition obtained from time-of-flight energy elastic recoil detection analysis shows an excess of carbon in all films, which is explained by differences in the angular distribution between C, Si, and Ti, where C scatters the least during sputtering. The oxygen content is 2.6 at. % in the film deposited at RT and decreases with increasing deposition temperature, showing that higher temperatures favor high purity films. Chemical bonding analysis by x-ray

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“…Likewise, the employment of multi-elemental powder metallurgical composite targets is of great interest from an industrial application point of view due to the enhanced stability and repeatability [11] of non-reactive sputtering compared to reactive sputtering processes. However, it has been shown that the chemical composition of thin films deposited from multi-element targets deviates from the target composition, especially in targets with significant mass differences between their constituents, such as TiB [12][13][14], TiW [15][16][17][18][19][20][21][22], WB [23], SiC [24], MoSi [25,26], VC [27], NbC [28], Cr-Al-C [29,30], Ti 2 AlC [31], Ti 3 SiC 2 [32,33], and CuZnSnSe [34]. The difference in the chemical film composition was attributed to several mechanisms: (i) the mass and size differences of the target constituents and the respectively associated different angular and energy distribution functions (EDF) of the sputtered species [12,25,26,29,35]; (ii) their mean free paths, as well as the energy transfer in collisions with the sputtering gas during transport [12,13,15,21,29,35]; and (iii) different sticking coefficients and re-sputtering of the film constituents by backscattered Ar [15][16][17][18]…”

Section: Introductionmentioning

confidence: 99%

Correlative Experimental and Theoretical Investigation of the Angle-Resolved Composition Evolution of Thin Films Sputtered from a Compound Mo2BC Target

et al. 2019

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The angle-resolved composition evolution of Mo-B-C thin films deposited from a Mo2BC compound target was investigated experimentally and theoretically. Depositions were carried out by direct current magnetron sputtering (DCMS) in a pressure range from 0.09 to 0.98 Pa in Ar and Kr. The substrates were placed at specific angles α with respect to the target normal from 0 to ±67.5°. A model based on TRIDYN and SIMTRA was used to calculate the influence of the sputtering gas on the angular distribution function of the sputtered species at the target, their transport through the gas phase, and film composition. Experimental pressure- and sputtering gas-dependent thin film chemical composition data are in good agreement with simulated angle-resolved film composition data. In Ar, the pressure-induced film composition variations at a particular α are within the error of the EDX measurements. On the contrary, an order of magnitude increase in Kr pressure results in an increase of the Mo concentration measured at α = 0° from 36 at.% to 43 at.%. It is shown that the mass ratio between sputtering gas and sputtered species defines the scattering angle within the collision cascades in the target, as well as for the collisions in the gas phase, which in turn defines the angle- and pressure-dependent film compositions.

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HPPMS deposition from composite targets: Effect of two orders of magnitude target power density changes on the composition of sputtered Cr-Al-C thin films

Cited by 21 publications

References 29 publications

Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Compositional dependence of epitaxial Tin+1SiCn MAX-phase thin films grown from a Ti3SiC2 compound target

Correlative Experimental and Theoretical Investigation of the Angle-Resolved Composition Evolution of Thin Films Sputtered from a Compound Mo2BC Target

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