2014
DOI: 10.1016/j.jallcom.2014.01.136
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Hopping of electron transport in granular Cux(SiO2)1–x nanocomposite films deposited by ion-beam sputtering

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Cited by 33 publications
(18 citation statements)
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“…as for dc measurements in [16,17]. In doing so, in the dielectric regime nanocomposites display predominance of capacitive contribution in the reactive part of impedance whereas for x > 0.68 nanocomposites being on metallic side of MIT show prevailing inductive-like contribution in the reactive impedance ImZ (f ) in the form of negative capacitance eect with θ > 0.…”
Section: Methodsmentioning
confidence: 86%
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“…as for dc measurements in [16,17]. In doing so, in the dielectric regime nanocomposites display predominance of capacitive contribution in the reactive part of impedance whereas for x > 0.68 nanocomposites being on metallic side of MIT show prevailing inductive-like contribution in the reactive impedance ImZ (f ) in the form of negative capacitance eect with θ > 0.…”
Section: Methodsmentioning
confidence: 86%
“…Such behavior is observed in many metalinsulator composites where metallic granules in the dielectric matrix are nanosized and show hopping mechanism of carrier transport due to jumps of electrons between the neighboring metallic nanoparticles (see [3,10,16,17]). …”
Section: Methodsmentioning
confidence: 87%
“…The samples with the metallic phase content x from 9.6 at.% to 72.9 at.% were examined directly after preparation (nonannealed samples). For checking the stoichiometry of the samples the X-ray microanalysis was used with an accuracy of ∼ 1% [25].…”
Section: Resultsmentioning
confidence: 99%
“…In the paper [25] the changes of matrix chemical composition for metallic phase Cu nanoparticles content within the range 9.6 at.% < x < 72.9 at.% were determined. Therefore there was introduced new nomenclature which includes the variability of oxygen content in the matrix for dierent metallic phase x content.…”
Section: Introductionmentioning
confidence: 99%
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