Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry

Campos, Luis M.; Meinel, I.; Guino, Rosette G.; Schierhorn, Martin; Gupta, Nalini; Stucky, Galen D.; Hawker, Craig J.

doi:10.1002/adma.200800330

Cited by 197 publications

(187 citation statements)

References 28 publications

(40 reference statements)

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“…Although the PDMS mold has been diversely used for various soft-NIL processes, the resolution of the imprinted pattern with PDMS mold has been limited to >100 nm due to its relatively low modulus (∼2 MPa) [97]. To achieve about 50 nm resolution, hard PDMS (h-PDMS) with a modulus of ∼9 MPa was developed [98].…”

Section: Nil Processes Using Sol-gel Solutionsmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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Abstract. Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in which nano-and micro-patterns are fabricated on various substrates. NIL provides high throughput and low cost in fabricating nano-structures due to its simple process and allows resolution below 10 nm without issues of light diffraction with conventional lithographic techniques. Its patterning mechanism is based on mechanical deformation of a polymer resist, which is simply done by pressing with a mold. This patterning mechanism also enables inorganic and organic-inorganic hybrid materials to be directly patterned by NIL. This article covers the recent progress of NIL-based direct patterning techniques and their applications to devices. Recently, functional nano-and micro-patterns have been applied to various electronic devices for the enhancement of overall performance. Fabrication methods of these devices are difficult using conventional lithographic techniques due to complex processes, high cost and low throughput. Direct NIL technique using functional resist can simply fabricate functional nano-and micro-structures and thus can be usefully applied to various industries.

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Section: Nil Processes Using Sol-gel Solutionsmentioning

confidence: 99%

Recent progress in direct patterning technologies based on nano-imprint lithography

Byeon

Lee

2012

Eur. Phys. J. Appl. Phys.

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“…[17] They surveyed a variety of polymeric blends based on PEG derivatives and appropriate complementary crosslinkers to find the most suitable blends for soft imprint lithographic applications. The crosslinking of polyfunctional thiols and alkenes was carried out for two minutes in the presence of oxygen.…”

Section: Hydrogels Through Photochemical Thiol-ene Click Reactionmentioning

confidence: 99%

Fabrication and Functionalization of Hydrogels through “Click” Chemistry

Yiğit

Sanyal

2011

Chemistry An Asian Journal

123

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On the occasion of the 10th anniversary of click chemistry FOCUS REVIEWSAbstract: Hydrogels are crosslinked polymeric materials that play a vital role in many biomedical areas such as drug delivery, sensor technology, and tissue engineering. Increasing demand of these materials for such advanced applications has necessitated the development of hydrogels with complex chemical compositions such as incorporating small molecules and biomolecules that provide the functional attributes. This Focus Review highlights the tremendous impact of click chemistry on the design, synthesis, and functionalization of hydrogels. The high efficiency and fidelity of the click reactions have enabled rapid and modular synthesis of hydrogels with near-ideal network structures. Efficient incorporation of biomolecular building blocks, such as peptide sequences either during or after the fabrication of hydrogels, have been achieved through various click reactions. Utilization of these efficient reactions has led to the fabrication of many stimuli-responsive or 'smart' hydrogels in recent years.

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“…In previous studies, UV-curing silicon rubber has been prepared by thiol-ene reaction [12,13]. In addition, thiol functional groups were successfully introduced on polydimethylsiloxane (PDMS) elastomer, and the thiol-functionalized PDMS was modified with hydrophilic molecules containing enes by using the thiol-ene click reaction [14].…”

Section: Introductionmentioning

confidence: 99%

An excellent ozone-resistant polymethylvinylsiloxane coating on natural rubber by thiol-ene click chemistry

Ning¹,

Zheng²,

Zhang³

et al. 2015

Express Polym. Lett.

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Abstract. Natural rubber (NR) as renewable resource is a kind of cheap and versatile elastomer. A disadvantage of NR is that the ozone resistance is not good, which needs to be improved for its wider application. In this study, polymethylvinylsiloxane (PMVS) coating on natural rubber (NR) was realized for the first time by using thiol-ene click reaction under UV irradiation, simultaniously realizing the fast crosslinking of PMVS layer and the covalent crosslinking between PMVS layer and NR layer. As a result, a good interphase adhesion between PMVS coating and NR was obtained. The coating of the crosslinked PMVS layer on NR resulted in an obvious increase in the ozone resistance of NR. Our study provides a new and high efficient strategy to prepare elastomer materials with good ozone resistance.

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Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol‐ene Click Chemistry

Cited by 197 publications

References 28 publications

Recent progress in direct patterning technologies based on nano-imprint lithography

Recent progress in direct patterning technologies based on nano-imprint lithography

Fabrication and Functionalization of Hydrogels through “Click” Chemistry

An excellent ozone-resistant polymethylvinylsiloxane coating on natural rubber by thiol-ene click chemistry

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