2012
DOI: 10.1109/ted.2012.2182770
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Highly Uniform, Self-Compliance, and Forming-Free ALD $\hbox{HfO}_{2}$ -Based RRAM With Ge Doping

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Cited by 82 publications
(47 citation statements)
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“…2(b). Subsequently, when the applied bias continues to increase, the ITO interface can undergo soft breakdown and cause another hetero-conductivepath, which acts as a self-built resistor [12], [13], as shown in Fig. 2(c).…”
Section: Methodsmentioning
confidence: 99%
“…2(b). Subsequently, when the applied bias continues to increase, the ITO interface can undergo soft breakdown and cause another hetero-conductivepath, which acts as a self-built resistor [12], [13], as shown in Fig. 2(c).…”
Section: Methodsmentioning
confidence: 99%
“…The same polarity was observed in similar devices described in previous researches. 13 14 After the Hf metal layer deposition and PMA processes, Pt/Hf/HfO 2 /TiN RRAM devices show reverse polarity operation (i.e., the set operation by a positive bias, and the reset operation by a negative bias) in a stable resistive switching situation, as shown in Figure 1(b). The experimental results and literatures review in this study will confirm that the reverse polarity is correlated with interface-producing and conduction mechanism, transforming between two structures.…”
Section: Methodsmentioning
confidence: 99%
“…A similar compliance to maximum current is needed during every SET transition to ensure repeatability of the LRS. This need is obviated if the device is self-compliant [25].…”
Section: A Rram Device Physicsmentioning
confidence: 99%