2012
DOI: 10.1007/s00339-012-6765-1
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Highly transparent ITO thin films on photosensitive glass: sol–gel synthesis, structure, morphology and optical properties

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Cited by 17 publications
(5 citation statements)
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“…ITO-based TCO films can exhibit different electro-optical, mechanical, electronic structure and composition properties depending on manufacturing technique. Many deposition techniques are used to prepare TCO coatings such as Dc and/or RF sputtering, chemical vapour deposition, reactive evaporation, molecular beam epitaxy, sol-gel method, electron beam evaporation and pulsed laser deposition [7][8][9][10][11][12][13][14]. However, the sol-gel technique has many advantages including cost effectiveness, short processing time, simplicity and the opportunity to fabricate coatings with high scalability along with the flexibility of finetuning coatings to have preferred shapes and surface areas [15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…ITO-based TCO films can exhibit different electro-optical, mechanical, electronic structure and composition properties depending on manufacturing technique. Many deposition techniques are used to prepare TCO coatings such as Dc and/or RF sputtering, chemical vapour deposition, reactive evaporation, molecular beam epitaxy, sol-gel method, electron beam evaporation and pulsed laser deposition [7][8][9][10][11][12][13][14]. However, the sol-gel technique has many advantages including cost effectiveness, short processing time, simplicity and the opportunity to fabricate coatings with high scalability along with the flexibility of finetuning coatings to have preferred shapes and surface areas [15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…[15] In addition, the symmetric spectra of both In 3d and Sn 3d indicate a single chemical state. [16] Fitting the asymmetric O 1s spectra results in two components located at 529.5 and 531.3 eV, corresponding to the bonded oxygen in the amorphous In 2 O 3 region and the oxygendeficient region of the In 2 O 3 matrix, respectively. [7] XRD pattern of sputtered ITO with a thickness of 700 nm is shown in Figure S3a, Supporting Information.…”
Section: Resultsmentioning
confidence: 99%
“…It was found that porous ITO electrodes could achieve as much as 140‐fold higher roughness than flat electrodes, as measured by redox current density of adsorbed ruthenium complex, owing to increased active surface area . The method was used to deposit a conductive anti‐reflective coating as well .…”
Section: Preparation Of Porous Transparent Conductive Oxidesmentioning
confidence: 85%