Highly sensitive novolak‐based X‐ray positive resist

Lingnau, J.; Dammel, Ralph R.; Theis, J.

doi:10.1002/pen.760291309

Cited by 11 publications

(4 citation statements)

References 10 publications

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“…The role of PFOS-free PAGs as an effective tool to catalyze the deprotection of high-activation type acid labile groups (∼35 kcal/mol) in a positive tone chemically amplified resist is best demonstrated through e-beam and EUV lithography. E-beam experiments were performed to understand the basic lithographic response (sensitivity and resolution) of these PAGs, because e-beam patterning is considered to be a close analogue of EUV lithography . The same resist compositions were then evaluated in EUV lithography experiments.…”

Section: Resultsmentioning

confidence: 99%

Arylonium Photoacid Generators Containing Environmentally Compatible Aryloxyperfluoroalkanesulfonate Groups

Ayothi

Cao

et al. 2007

Chem. Mater.

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Photoacid generators (PAGs) producing environmentally benign 2-phenoxytetrafluoroethanesulfonate fluoroorganic sulfonic acids were synthesized. Synthesis and characterization of the new PAGs composed of 2-phenoxytetrafluoroethanesulfonate with diphenyliodonium or triphenylsulfonium units are described. Characteristics of the onium PAGs were evaluated and compared with perfluorobutanesulfonate (PFBS)-based onium PAGs. The newly synthesized compounds efficiently produced sulfonic acid photochemically upon exposure to selected radiation (254 nm, e-beam, and 13.4 nm wavelengths). The sulfonic acid generated from the new PAGs contains far fewer perfluorinated carbon atoms than those found in widely used perfluorooctanesulfonate (PFOS) PAGs and successfully catalyzed deprotection of the acid-labile tert-butoxycarbonyl, methyladamantyl ester, and tert-butyl ester groups present in model positive tone chemically amplified resists (CARs). Their influence on the lithographic performance of chemically amplified resists was investigated using e-beam and extreme ultraviolet (EUV or 13.4 nm) radiation. For the first time, the capability of PFOS-free PAGs for EUV lithographic application in a CAR was demonstrated by comparing resist sensitivity, resolution, and line-edge roughness (LER) with resist formulations containing PFBS-based diphenyliodonium and triphenylsulfonium PAGs. These new PAGs are attractive for lithographic applications as alternatives to the widely used PFOS PAGs because environmental and performance issues require the availability of strong acid PFOS-free photoacid generators.

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Section: Resultsmentioning

confidence: 99%

Arylonium Photoacid Generators Containing Environmentally Compatible Aryloxyperfluoroalkanesulfonate Groups

Ayothi

Cao

et al. 2007

Chem. Mater.

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“…Tests on its stability are currently in progress at the Institute for Microtechnology at Mainz. The latter has produced a negative resist with a sensitivity 20 times that of PMMA using novalak, a crosslinker, and an acid generator [84,85].…”

Section: New Resistsmentioning

confidence: 99%

Microfabrication using synchrotron radiation

Tolfree¹

1998

Rep. Prog. Phys.

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The realization of precision deep microstructures requires high-energy, intense parallel beams of x-rays from synchrotron radiation sources and novel process technology. Deep x-ray lithography with synchrotron radiation is basically a shadow printing process in which a two-dimensional pattern is accurately transferred from a mask into a resist material by chemical changes induced by the radiation. Subsequent electroforming and moulding processes are used to manufacture microstructures from metals, plastics and ceramics. This process, known as LIGA (LIthographie, Galvanoformung, and Abformung), first developed in Germany, is based on a combination of lithography, electroforming and replication processes. The development of the LIGA process for the fabrication of a wide range of precision microstructures has been stimulated by the increasing use of synchrotron radiation sources for lithography.Applications for microstructures exist in many sectors of industry. These include chemical and process engineering, biomedical instrumentation, automotive and aerospace technology, environmental monitoring and information technology. Emphasis is placed on three main areas, micromechanics, micro-optics and microfluidics, which are emerging with the widest range of industrial applications.This paper reviews the progress being made in microfabrication technology using x-ray beam lithography and the LIGA process. It includes a description of synchrotron radiation, storage ring sources, the fabrication processes, applications and potential markets. Reference is also made to European networks and R&D activity worldwide.

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“…Several other families of chemically amplified resists, also based on processes catalyzed by radiation-generated acid, have been described. Of particular interest, in the context of this report, are the resists that operate via electrophilic aromatic substitution [7][8][9]. For example, we have described a negative resist that involves a copolymer of 4-hydroxystyrene and 4-acetoxymethylstyrene in combination with radiation-sensitive acid precursors.…”

mentioning

confidence: 99%