Highly Selective Optical Filtering Technology on 300 mm Glass Wafer for Advanced Spectroscopy Applications

Villenave, S.; Monfray, S.; Abadie, Quentin; Audran, S.; Guillaumet, S.; Ristoiu, D.; Benisty, Henri

doi:10.1364/cleo_at.2022.jw3a.41

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Structures Design Spectral Response and Tunability1

High Contrast Grating1

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2023

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Cited by 2 publications

(2 citation statements)

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“…In particular, for RWG structures with actual a-Si refractive indices (i.e. complex indices, with possibly a non-zero imaginary part), the incident signal in the visible range is mostly absorbed, and so resonances in this domain are attenuated or even non-existent, as seen experimentally in [36]. A common issue with a-Si is the deposition-method-dependent material dispersion, which is quite large.…”

Section: Structures Design Spectral Response and Tunabilitymentioning

confidence: 99%

Resonant waveguide vs Fabry-Perot cavity: A comparative study for CMOS spectral sensor technology

Omeis¹,

Villenave²,

Besbes³

et al. 2023

Photonics and Nanostructures - Fundamentals and Applications

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Section: Structures Design Spectral Response and Tunabilitymentioning

confidence: 99%

Resonant waveguide vs Fabry-Perot cavity: A comparative study for CMOS spectral sensor technology

Omeis¹,

Villenave²,

Besbes³

et al. 2023

Photonics and Nanostructures - Fundamentals and Applications

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“…High contrast grating achieves 100 % reflection and can therefore be used to filter light [8,9]. Transmission of the grating is computed with Reticolo [10] and plotted for both polarizations TE and TM in Figure 2.…”

Section: High Contrast Gratingmentioning

confidence: 99%

Bloch mode analysis of subwavelength polarizing planar optics

Mulin

Deneuville

Jeannin

et al. 2023

High Contrast Metastructures XII

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The purpose of this paper is to investigate the impact of advanced immersion lithography process for the development of polarization optics at pixel level on CMOS image sensors. In the first part of this paper, we use Bloch formalism to define regimes that depend on the number of propagative Bloch modes within the structure. The presented analysis gives estimations of required features size to operate in NIR and visible range. The second part of this paper present optical characterization of silicon lamellar grating made on 300 mm wafer using advanced immersion lithography. Characterization results are discussed with respect to optical simulations and reconstructed grating profile is compared to patterning features estimated during first part.

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Highly Selective Optical Filtering Technology on 300 mm Glass Wafer for Advanced Spectroscopy Applications

Abstract: This paper presents the fabrication and measurements of optical rejection filters, made of dielectric nanogratings developed on 300 mm glass wafer using CMOS process. Their suitability for integrated VIS-NIR spectroscopy applications is assessed.

Cited by 2 publications

References 2 publications

Resonant waveguide vs Fabry-Perot cavity: A comparative study for CMOS spectral sensor technology

Resonant waveguide vs Fabry-Perot cavity: A comparative study for CMOS spectral sensor technology

Bloch mode analysis of subwavelength polarizing planar optics

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