Highly reflective coatings for micromechanical mirror arrays operating in the DUV and VUV spectral range

Abstract

High reflecting low-stress optical coatings for the next-generation of micro mechanical mirrors have been developed. The optimized metal systems are applicable from VUV and DUV down to the UV and VIS spectral region and can be integrated in the technology of MOEMS, such as spatial light modulators (SLM) and micro scanning mirrors. This optimized metal designs enable to reconcile high optical performances with adequate mechanical properties and convenient CMOS compatibility. Currently, micro-mirror arrays with enhanced highly reflective coatings for DUV (A. = 193 nm) and VUV ()t 157 nm) exist as prototypes

CMOS-integrated sige MEMS: Application to micro-mirrors

“…Monolithically integrated micro-mirror arrays are well established devices in applications such as video projection [8,18] and mask writers [19]. Micro-mirror devices are also becoming more prevalent for other applications such as in printed circuit board manufacturing, semiconductor packaging and bio-medical applications [20].…”

Past progress, current status, and future perspective of digital EUV lithography for high-resolution semiconductor manufacturing

“…Fruitful technological advances had been made by various research teams, spanning a wide range of technical fields from system-level architecture, data compression and decompression, storage/interface circuit design, imaging strategy and optimization, [8][9][10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] to dynamics, control and fabrication of micromirror devices. [27][28][29][30][31][32][33][34][35][36][37][38][39][40][41][42][43][44][45] Unfortunately, the university research funding dropped in a time frame of one to two years (2006)(2007), resulting in significantly slowed progress and even technological stagnation which were reflected in overall reduction of publication activity in projection maskless lithography after 2007. Although research teams from Micronic, ASML, Bell Lab, and Imec continued to make technical contributions, most of them were targeted at DUV wavelength.…”

Highly reliable and extremely stable SiGe micro-mirrors

“…Monolithic integrated micro-mirror arrays are already well established devices in applications such as video projection [1], adaptive optics, mask writers [2], etc… The majority of current integrated micro-mirrors is Aluminum (Al)-based [1,2], often giving rise to reliability problems such as the hinge memory effect [3]. Replacing Al by Silicon (Si) solves the problem, but integrating the Si mirrors with the CMOS driving circuitry can only be accomplished by wafer bonding technique [3].…”