1998
DOI: 10.1143/jjap.37.6060
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Highly Oriented Nb-Doped Lead Titanate Thin Films by Reactive Sputtering: Electrical Properties

Abstract: Some electrical properties of niobium-doped highly (001)-oriented lead titanate thin films epitaxially grown on (100)Pt/(100)MgO substrates by reactive sputtering have been analyzed. The dielectric permittivity, which ranged from 160 to 200, had its minimum value corresponding to a niobium concentration of 1 mol%. Doped samples exhibited outstanding low dielectric losses, lower than 2.5%, compared to undoped ones. Current-voltage (I–V) leakage characteristics of doped samples were considerably better than thos… Show more

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Cited by 3 publications
(1 citation statement)
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“…Therefore, far from lowering the resistivity, slightly doping of Nb actually increases it. 28 Secondly, the extra electrons provided by Nb are not totally itinerant, instead they are mainly locate around one Ti orbits. This will be further discussed later in the present article based on our first principle calculations.…”
Section: Resultsmentioning
confidence: 99%
“…Therefore, far from lowering the resistivity, slightly doping of Nb actually increases it. 28 Secondly, the extra electrons provided by Nb are not totally itinerant, instead they are mainly locate around one Ti orbits. This will be further discussed later in the present article based on our first principle calculations.…”
Section: Resultsmentioning
confidence: 99%