Improving the adhesion property of
graphene directly grown on an
insulating substrate is essential for promoting the reliability and
durability of the related applications. However, effective approaches
have rarely been reported, especially for vertically oriented graphene
(VG) films grown on insulating templates. To tackle this, we have
developed a facile synthetic strategy by introducing an ultrathin
(10 nm-thick) titanium (Ti) film on a quartz glass substrate as the
adhesion layer, for plasma-enhanced chemical vapor deposition (PECVD)
growth of VG films. This synthetic process induces the formation of
Ti, oxygen (O), carbon (C)-containing adhesion layer (Ti (O, C)),
offering improved interfacial adhesion due to the formation of chemical
bonds among Ti and C atoms. Dramatically improved surface and interface
stabilities have been achieved, with regard to its counterpart without
a Ti adhesion layer. Moreover, we have also realized precise controls
of the transparent/conductive property, surface roughness, and hydrophobicity, etc., by varying the VG film growth time. We have also demonstrated
the very intriguing application potentials of the hybrids in light-dimming
related fields, that is, electro-heating defogging lenses and neutral
density filters toward medical endoscope defogging and camera photography.