2020
DOI: 10.1007/s10562-020-03224-w
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Highly Active and Stable Fe/SiO2 Catalyst Synthesized by Atomic Layer Deposition for CO Oxidation

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Cited by 7 publications
(2 citation statements)
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“…The peaks at binding energies of 712, 530, and 183 eV represent Fe 2p, O 1s, and Zr 3d, respectively. , Comparing the XPS high-resolution spectra of Fe 2p for both fresh and spent samples is provided in Figure a. In the fresh sample, two characteristic peaks of Fe 2p 3/2 and Fe 2p 1/2 appeared at 712.62 and 726 eV, as well as two satellite peaks at 719.01 and 731.74 eV, respectively. , The satellite peak of 719 eV binding energy (approximately 8 eV above the main peak of Fe 2p 3/2 ) confirms the existence of Fe 2 O 3 and active Fe 3+ species in the fresh sample. Such high binding energies of the fresh sample imply the presence of Fe 3+ ions in Fe 2 O 3 species.…”
Section: Results and Discussionmentioning
confidence: 99%
“…The peaks at binding energies of 712, 530, and 183 eV represent Fe 2p, O 1s, and Zr 3d, respectively. , Comparing the XPS high-resolution spectra of Fe 2p for both fresh and spent samples is provided in Figure a. In the fresh sample, two characteristic peaks of Fe 2p 3/2 and Fe 2p 1/2 appeared at 712.62 and 726 eV, as well as two satellite peaks at 719.01 and 731.74 eV, respectively. , The satellite peak of 719 eV binding energy (approximately 8 eV above the main peak of Fe 2p 3/2 ) confirms the existence of Fe 2 O 3 and active Fe 3+ species in the fresh sample. Such high binding energies of the fresh sample imply the presence of Fe 3+ ions in Fe 2 O 3 species.…”
Section: Results and Discussionmentioning
confidence: 99%
“…In this sense, the development of devices applied to industrial processes [ 1 ], home security [ 2 ], monitoring of air quality [ 3 ] and explosives [ 4 ], and the detection of pollutants [ 5 ] and toxic compounds [ 6 ] are essential, in addition to wearable devices used as accessories and implants [ 7 ]. The manufacturing process of devices can involve a broad range of deposition techniques, such as sol-gel process [ 8 , 9 , 10 , 11 , 12 ], sputtering [ 13 , 14 ], chemical vapor deposition (CVD) [ 15 ], plasma spray [ 16 , 17 ], microwave-assisted synthesis [ 18 , 19 ], and the disruptive technique atomic layer deposition (ALD) [ 20 , 21 , 22 ].…”
Section: Introductionmentioning
confidence: 99%