2009
DOI: 10.1109/ted.2008.2010603
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High-Voltage GaAs Photovoltaic Laser Power Converters

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Cited by 114 publications
(62 citation statements)
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“…The results are mostly applicable for monochromatic applications using dual-junction cells [11,13], yet they give insight for devices with more junctions, as recently presented in Ref. [14].…”
Section: Photovoltaic Laser Power Convertersmentioning
confidence: 68%
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“…The results are mostly applicable for monochromatic applications using dual-junction cells [11,13], yet they give insight for devices with more junctions, as recently presented in Ref. [14].…”
Section: Photovoltaic Laser Power Convertersmentioning
confidence: 68%
“…Another technological approach is based on monolithic integration. This can be implemented by lateral segmentation (multi-segment cell, also known as monolithic interconnected module or MIM) [10][11][12] or by vertical stacking of several subcells (multi-junction cell) [11][12][13][14]. In this work, cells of the latter approach are investigated, namely, vertically interconnected dual-junction cells realized by monolithic growth of two subcells on top of each other.…”
Section: Photovoltaic Laser Power Convertersmentioning
confidence: 99%
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“…При разработке ФЭП, работающих в диапазоне длин волн излучения 600−870 nm, оптимальными материа-лами являются полупроводниковые соединения GaAs и GaInAsP. В ФЭП с активной областью на основе GaAs достигнута наибольшая эффективность (более 50%) при преобразовании лазерного излучения в диапазоне длин волн 800−870 nm [7][8][9][10] для рабочей длины волны излучения 808 nm, при внешнем квантовом выходе фо-тоответа, близком к 100%. Теоретически рассчитанный предел КПД ФЭП на основе GaAs при преобразо-вании монохроматического излучения с длиной вол-ны 870 nm составляет 78% при плотности фототока порядка 10 A/cm 2 [8].…”
Section: (поступило в редакцию 8 декабря 2017 г)unclassified
“…These multi-subcell photovoltaic devices are featuring record conversion efficiencies. [12][13][14][15][16][17][18][19][20][21][22] However, while the upper limit of the p/n junction thickness has been well characterized in the past for GaAs or other III-V semiconductor alloys, the lower limit of the base thickness is still unknown despite the great progress in the field recently. [23][24][25][26][27][28] In this work, we therefore explore the thinnest p/n junctions achievable in practice in GaAs VEHSA structures.…”
mentioning
confidence: 99%