High Throughput Ultralong (20 cm) Nanowire Fabrication Using a Wafer-Scale Nanograting Template

Yeon, Jeongho; Lee, Young Jae; Yoo, Dong Eun; Yoo, Kyoung Jong; Kim, Jin Su; Lee, Jun; Lee, Jeong Oen; Choi, Seon‐Jin; Yoon, Gun‐Wook; Lee, Dong Hoon; Lee, Gi Seong; Hwang, Hae Chul; Yoon, Jun‐Bo

doi:10.1021/nl400209n

Cited by 38 publications

(26 citation statements)

References 48 publications

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“…A 1D nanograting with a pitch of 95 nm, width of 60 nm, and height of 150 nm was used as a template to form the Al WGP. A large‐area (8 inch) Si master with a 95 nm pitch nanograting was fabricated by spacer lithography . The 1D nanograting template was formed on a polycarbonate (PC) film by replicating the Si master using UV–nanoimprint lithography (UV–NIL) .…”

Section: Resultsmentioning

confidence: 99%

Solution‐Processed Aluminum Nanogratings for Wire Grid Polarizers

Kang

Yun

Jang

et al. 2018

Advanced Optical Materials

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polarized light, the WGP behaves like a metallic mirror, which reflects the incident light because of its high effective extinction coefficient; for transverse magnetic (TM)-mode polarized light, the WGP acts as a dielectric layer, effectively transmitting the incident light. [4] Al is the most commonly used material for WGPs because its refractive indices having low real and high imaginary parts are adequate in providing high TM transmission and TE reflection ( Figure S1, Supporting Information). [4][5][6] Accordingly, the highest performance for both the TM transmittance and extinction ratio (ratio of TM-to TE-mode transmittances) is expected when using Al compared with other metals ( Figure S1g, Supporting Information). Moreover, Al is one of the most abundant metals on earth, low-cost, light-weight, and environmentally stable. Theoretically, an extinction ratio and TM transmittance exceeding 10 000 and 85%, respectively, are expected from sub-100 nm pitch Al WGP. [5,7] To fabricate high-aspect-ratio Al nanostructures, various fabrication processes have been proposed. Especially, nanoimprint lithography, which can produce polymer nanopatterns almost infinitely through repetitive replication from a single master mold, has been widely used. High-aspect-ratio Al nanostructure was formed on the sidewall of a nanoimprinted polymer template by angled metal evaporation and reactive ion etching (RIE). [8][9][10][11] Nanoimprinted polymer resist was also used as an etch mask to create Al nanostructures using RIE. [7,12] However, processes requiring vacuum evaporation and RIE may be insufficiently cost-effective and highthroughput to manufacture Al WGPs. Bottom-up approaches to fabricate WGPs have been attempted, such as colloidal assembly, [13,14] metal-containing block copolymers, [15] and nanowire alignment. [16][17][18] However, the limitations of the material selection and structural versatility caused unsatisfactory WGP performance. Although the formation of metal structures through both electro-and electroless plating has been proposed, a specifically modified template is required for the site-selective growth of metals. [19][20][21][22] For example, hydrophobic or insulating nanostructure was prepared while exposing the hydrophilic or conducting substrate on the bottom portions of the structures, which requires dry etching or photolithography. [19][20][21][22] Moreover, unlike noble metals, the formation of Al nanostructures using solution processes is rare because of the high reactivity of Al with both oxygen and water. Previous studies The wire grid polarizer (WGP) consisting of parallel metal nanogratings is an attractive alternative to conventional polarizers because it offers thin layer thickness, easy integration capability, and outstanding chemical and thermal stability. In this report, a facile solution process is proposed for fabricating Al WGPs. High-aspect-ratio Al nanostructures are formed in a 1D nanoimprinted template by electroless plating. Because of the geometrically irreversible deposition and ...

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Section: Resultsmentioning

confidence: 99%

Solution‐Processed Aluminum Nanogratings for Wire Grid Polarizers

Kang

Yun

Jang

et al. 2018

Advanced Optical Materials

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“…In this step, we employed the glancing-angle deposition method, where the plane of the polymer replica substrate is not perpendicular to the deposition direction of the materials 39,40 , enabling the formation of discrete nanostructures on the replicas. The deposition angle from the substrate surface normal was modulated and optimized between 60°and 80°, depending on the pattern size and the template depth.…”

Section: Resultsmentioning

confidence: 99%

High-resolution nanotransfer printing applicable to diverse surfaces via interface-targeted adhesion switching

et al. 2014

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Nanotransfer printing technology offers outstanding simplicity and throughput in the fabrication of transistors, metamaterials, epidermal sensors and other emerging devices. Nevertheless, the development of a large-area sub-50 nm nanotransfer printing process has been hindered by fundamental reliability issues in the replication of high-resolution templates and in the release of generated nanostructures. Here we present a solvent-assisted nanotransfer printing technique based on high-fidelity replication of sub-20 nm patterns using a dual-functional bilayer polymer thin film. For uniform and fast release of nanostructures on diverse receiver surfaces, interface-specific adhesion control is realized by employing a polydimethylsiloxane gel pad as a solvent-emitting transfer medium, providing unusual printing capability even on biological surfaces such as human skin and fruit peels. Based on this principle, we also demonstrate reliable printing of high-density metallic nanostructures for non-destructive and rapid surface-enhanced Raman spectroscopy analyses and for hydrogen detection sensors with excellent responsiveness.

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“…In a successful effort to produce tens of nanometerscale nanogratings over a large area, we previously developed a pattern downscaling technology based on multiple spacer lithography and pattern-recovery techniques [15]. As a result, highly compact and continuous 100 nm pitch silicon nanogratings were successfully fabricated on 8-inch wafer, and the method allowed us to fabricate various material-based nanowires easily with extremely high aspect ratio (4,000,000:1).…”

Section: Introductionmentioning

confidence: 99%

Realization of large-scale sub-10 nm nanogratings using a repetitive wet-chemical oxidation and etching technique

Choi

Seo

et al. 2017

Micro and Nano Syst Lett

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Despite many efforts to create nanogratings to exploit exceptionally enhanced nano-sized effects, realizing sub-10 nm nanogratings on a large area still remains a great challenge. Herein, we demonstrate fabrication of an inchscale sub-10 nm nanogratings with simple and reliable features, by employing a repetitive wet-chemical oxidation and etching technique. We found that a few atomic layers of the silicon surface are naturally oxidized in a nitric acid (HNO 3 ) solution, which enables the surface of the silicon to be etched with 1.0 nm resolution by selectively removing the oxide layers. By combining this high-precision etching technique with silicon nanogratings previously prepared by conventional methods, we successfully demonstrated a sub-10 nm silicon nanogratings on an inch-scale wafer.

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High Throughput Ultralong (20 cm) Nanowire Fabrication Using a Wafer-Scale Nanograting Template

Cited by 38 publications

References 48 publications

Solution‐Processed Aluminum Nanogratings for Wire Grid Polarizers

Solution‐Processed Aluminum Nanogratings for Wire Grid Polarizers

High-resolution nanotransfer printing applicable to diverse surfaces via interface-targeted adhesion switching

Realization of large-scale sub-10 nm nanogratings using a repetitive wet-chemical oxidation and etching technique

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