2014
DOI: 10.1016/j.egypro.2013.12.007
|View full text |Cite
|
Sign up to set email alerts
|

High-throughput Processes for Industrially Scalable Deposition of Zinc Oxide at Atmospheric Pressure

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2018
2018
2018
2018

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 24 publications
0
1
0
Order By: Relevance
“…However, growth of ultra-thin ZnO by conventional APCVD remains a challenge due to high film growth rates (in the order of 10 nm s -1 ) making the process hard to control. [7] To address this problem, here we propose an aerosol-assisted CVD technique to synthesis conformal ZnO coatings with thickness down to 20 nm onto textured FTO electrodes and serve as the ETL in planar PSCs. The resulting CH3NH3PbI3 PSCs fabricated under ambient conditions achieves a maximum power conversion efficiency of 11.75%.…”
Section: Introductionmentioning
confidence: 99%
“…However, growth of ultra-thin ZnO by conventional APCVD remains a challenge due to high film growth rates (in the order of 10 nm s -1 ) making the process hard to control. [7] To address this problem, here we propose an aerosol-assisted CVD technique to synthesis conformal ZnO coatings with thickness down to 20 nm onto textured FTO electrodes and serve as the ETL in planar PSCs. The resulting CH3NH3PbI3 PSCs fabricated under ambient conditions achieves a maximum power conversion efficiency of 11.75%.…”
Section: Introductionmentioning
confidence: 99%