2019
DOI: 10.1049/iet-cds.2018.5118
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High‐speed sub‐threshold operation of carbon nanotube interconnects

Abstract: Sub-threshold voltage operated circuits are the future for ultra-low-power applications. These circuits are inherently slow due to the very small sub-threshold currents. Here, the authors propose two approaches for improving the speed of SWCNT bundle interconnects driven by CNTFET-based circuits under sub-threshold conditions. First, the authors modulate the channel length of the CNTFETs that are used in the driver circuits to increase sub-threshold output current. The output current is maximum when the channe… Show more

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Cited by 11 publications
(5 citation statements)
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“…Further discussions and models of phonon scattering in CNT interconnects can be found here. 27 The temperature profile of the interconnects depicted in Fig. 3c inset looks similar for both S-CNT and T-CNT interconnects.…”
Section: Proposed Fabrication Steps Of T-cnt Bundle Interconnectsmentioning
confidence: 76%
“…Further discussions and models of phonon scattering in CNT interconnects can be found here. 27 The temperature profile of the interconnects depicted in Fig. 3c inset looks similar for both S-CNT and T-CNT interconnects.…”
Section: Proposed Fabrication Steps Of T-cnt Bundle Interconnectsmentioning
confidence: 76%
“…These transistors can also exhibit ballistic transport of charge carriers between the source and drain terminals at higher speeds [34][35][36][37]. In other words, CNTFETs can have the similar physical structure as the MOSFETs, but with the only difference that in CNTFET the carbon nanotubes (CNT) between the drain and source terminals act as the conducting channels [38].…”
Section: A Brief Review On Carbon Nanotube Field Effect Transistor Te...mentioning
confidence: 99%
“…As reported in [38], the major advantage of the CNTFETs is their threshold voltage tunability. The threshold voltage of a CNTFET is inversely related to the diameter of the nanotube as it is given in Equation ().…”
Section: A Brief Review On Carbon Nanotube Field Effect Transistor Te...mentioning
confidence: 99%
See 1 more Smart Citation
“…Although an increase in resistivity primarily responsible for higher resistance of metallic interconnect and becomes encumbrance due to hillock formation, surface, and grain boundary scattering [1]. Besides, the crosstalk‐induced delay becomes the bottleneck for advanced technology due to the closer proximity of wires and higher interconnect density [2]. For higher interconnect lengths, the per unit length (p.u.l.)…”
Section: Introductionmentioning
confidence: 99%