High Speed PVD Thermal Barrier Coatings

Beele, W.; Eschendorff, G.

doi:10.1002/adem.200600049

Cited by 9 publications

(4 citation statements)

References 2 publications

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“…The high‐speed physical vapor deposition (HS‐PVD) is a special variant of the PVD process and belongs to the family of sputter techniques, which is based on hollow cathode discharge (HCD) and gas flow sputtering (GFS). [ 16 ] In a reactive HS‐PVD process, the metallic target is first atomized and convectively removed from the sputter source via the inert gas flow. [ 17 ] The reactive gas is added outside the hollow cathode and so has less contact to the target surface.…”

Section: Introductionmentioning

confidence: 99%

An Approach to Synthesize Thick α‐ and γ‐Al₂O₃ Coatings by High‐Speed Physical Vapor Deposition

2022

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Crystalline α‐ and γ‐Al2O3 exhibit in many applications high wear resistance, chemical resistance, and hot hardness, making them interesting materials for production engineering. To synthesize α‐Al2O3 with high coating thickness of s ≥ 10 μm, chemical vapor deposition at temperatures T > 1000 °C is well established. However, there are almost no studies dealing with the synthesis of thick α‐Al2O3 by physical vapor deposition (PVD) at high temperatures T > 700 °C. High‐temperature deposition of thick coatings can be realized by means of the dense hollow cathode plasma, combined with the transport function of the plasma gas in high‐speed (HS) PVD. Herein, crystalline α‐ and γ‐Al2O3 films are deposited on cemented carbides at substrate temperatures T s ≈ 570 °C and T s ≈ 780 °C by HS‐PVD. These coatings exhibit a thickness up to s = 20 μm. Moreover, phase analysis presents α‐phases in coatings synthesized at substrate temperature of T s ≈ 780 °C with significant higher hardness than films by T s ≈ 570 °C. These release the potential of HS‐PVD to synthesize α‐Al2O3 coatings with high thickness. Thereby, a higher thickness of these coatings is beneficial for the wear protection of turning and die casting tools.

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Section: Introductionmentioning

confidence: 99%

An Approach to Synthesize Thick α‐ and γ‐Al₂O₃ Coatings by High‐Speed Physical Vapor Deposition

2022

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“…The high speed physical vapor deposition (HS‐PVD) is a special variant of the PVD process and belongs to the family of sputter techniques which is based on hollow cathode discharge (HCD) and gas flow sputtering (GFS). [ 30 ] Due to the unique gas flow‐driven material transport, line‐of‐sight characteristic of conventional PVD technologies is overcome by means of HS‐PVD technology. Moreover, previous studies have shown that (Ti,Al,Si)N coatings, deposited by HS‐PVD, had a promising potential for the erosion protection of compressor blades, due to their dense microstructures, smooth surfaces, and a high bonding strength between coating and substrate.…”

Section: Introductionmentioning

confidence: 99%

Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

2021

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To increase the erosion and corrosion resistance of compressor blades, hard (Cr,Al,Si)N coatings are used. Physical vapor deposition (PVD) is a well‐known method for the deposition of nitride hard coatings. The application of pulse technique in power supply of conventional PVD technologies like magnetron sputtering shows a great potential for increasing the durability and lifetime of different tools and components. However, one disadvantage of conventional PVD is the line‐of‐sight characteristic. This is eliminated by means of the convection‐driven transport mechanism in high speed physical vapor deposition (HS‐PVD) technology, based on gas flow sputtering. Herein, the influence of gas flow sputtering with bipolar pulsed direct current (DC) power supply on coating properties and impact resistance of (Cr,Al,Si)N/substrate compound is investigated. Thereby, (Cr,Al,Si)N coatings are deposited onto X3CrNiMo13‐4 by HS‐PVD using continuous DC and bipolar pulsed DC supply. Nanoindentation analyses show an increase in indentation hardness using pulsed DC compared with continuous DC. Moreover, the lowest imprint depth and degree of cohesive and adhesive failures are observed in this case. These release a high potential for pulsed power supply in HS‐PVD, resulting in denser morphology, higher hardness and impact resistance compared with DC.

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“…Owing to the unique combination of the highly ionized plasma and the gas flow-driven material transport, high-rate deposition of physical vapor deposition coatings with a dense microstructure and a high bonding strength can be achieved [33,34].…”

Section: Introductionmentioning

confidence: 99%

Deposition of a nanocomposite (Ti, Al, Si)N coating with high thickness by high‐speed physical vapor deposition

Bobzin

Brögelmann

Kalscheuer

et al. 2020

Materialwissenschaft Werkst

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Nanocomposite coatings such as (Ti, Al, Si)N have been demonstrated as promising candidates for the use as protection against solid particle erosion for compressor blades. Typically, nanocomposite (Ti, Al, Si)N coatings are deposited by different physical vapor deposition (PVD) techniques. However, the relatively low coating thickness up to a few micrometers due to low deposition rates leads to a limited lifetime of the coatings under erosive particle bombardment. In this study, the deposition of a nanocomposite (Ti, Al, Si)N coating was performed by a hollow cathode gas flow sputtering method, the high‐speed physical vapor deposition, which enables the high‐rate deposition of thick coatings. Morphology and microstructure of the coating were investigated via scanning electron microscopy and transmission electron microscopy, respectively. Tribological characterization by impact tests and erosion tests demonstrates that the nanocomposite (Ti, Al, Si)N coated sample reveals a promising resistance against impact loads and the solid particle erosion. Summarily, nanocomposite (Ti, Al, Si)N coatings deposited by the high‐speed physical vapor deposition provide a high potential for the erosion protection of compressor blades.

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High Speed PVD Thermal Barrier Coatings

Cited by 9 publications

References 2 publications

An Approach to Synthesize Thick α‐ and γ‐Al₂O₃ Coatings by High‐Speed Physical Vapor Deposition

An Approach to Synthesize Thick α‐ and γ‐Al₂O₃ Coatings by High‐Speed Physical Vapor Deposition

Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

Deposition of a nanocomposite (Ti, Al, Si)N coating with high thickness by high‐speed physical vapor deposition

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High Speed PVD Thermal Barrier Coatings

Cited by 9 publications

References 2 publications

An Approach to Synthesize Thick α‐ and γ‐Al2O3 Coatings by High‐Speed Physical Vapor Deposition

An Approach to Synthesize Thick α‐ and γ‐Al2O3 Coatings by High‐Speed Physical Vapor Deposition

Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

Deposition of a nanocomposite (Ti, Al, Si)N coating with high thickness by high‐speed physical vapor deposition

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An Approach to Synthesize Thick α‐ and γ‐Al₂O₃ Coatings by High‐Speed Physical Vapor Deposition

An Approach to Synthesize Thick α‐ and γ‐Al₂O₃ Coatings by High‐Speed Physical Vapor Deposition