High speed flat guide ceramic stage for electron-beam lithography system

Tsuyuzaki, H.; Shimazu, Nobuo; Fujinami, Minpei

doi:10.1116/1.583313

Cited by 8 publications

(3 citation statements)

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Section: Wafer Stagementioning

confidence: 99%

“…As the X ‐ Y table moves along the Y axis, the Y slider bar slides in a square channel along the Y guide plane, and then the X guide bar forces the X ‐ Y table to move. For the movement along the X axis, the X plane in the X ‐ Y table moves along the X guide bar 20 …”

Section: Wafer Stagementioning

confidence: 99%

“…For the movement along the X axis, the X plane in the X-Y table moves along the X guide bar. 20 Figure 2 shows the structure of Canon FPA-2000 photolithography system. In this system, movements in X-, Y-, and Z-directions are controlled precisely by double-layer mechanical guide, which has been used in the 0.5 μm process.…”

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confidence: 99%

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Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Song

Chen

Huo³

et al. 2021

Int Journal of Mech Sys Dyn

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As one of the most advanced and precise equipment in the world, a photolithography scanner is able to fabricate nanometer-scale devices on a chip. To realize such a small dimension, the optical system is the fundamental, but the mechanical system often becomes the bottleneck. In the photolithography, the exposure is a dynamic process. The accuracy and precision of the movement are determined by the mechanical system, which is even more difficult to control compared with the optical system. In the mechanical system, there are four crucial components: the reticle and wafer stages, the linear motor, the metrology system, and the control system. They work together to secure the reticle and substrate locating at the correct position, which determines the overlay and alignment performance in the lithography. In this paper, the principles of these components are reviewed, and the development history of the mechanical system is introduced.

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Section: Wafer Stagementioning

confidence: 99%

Section: Wafer Stagementioning

confidence: 99%