High sensitivity positive tone x-ray resist: RAY-PF-performance under e-beam exposure

Menschig, A.; Forchel, A.; Dammel, Ralph R.; Lingnau, J.; Scheunemann, U.; Theis, J.; Pongratz, S.

doi:10.1016/0167-9317(89)90122-6

Cited by 5 publications

(1 citation statement)

References 5 publications

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“…4 We have previously described the use of 2-nitrobenzyl sulfonate esters as covalent, highly soluble, nonmetallic photogenerators of tosic acid.6-7 Other workers have reported covalent compounds capable of photogenerating nonactivated aryl sulfonic acids,8-11 methanesulfonic acid,12 and hydrogen halides. 13,14 However, these systems all release acids having relatively nucleophilic anions compared with hexafluoroarsenic and f Barnard College, New York. triflic acid, which can be formed by the irradiation of onium salts.…”

Section: Introductionmentioning

confidence: 99%

Photoconductor fatigue. 1. Photochemistry of hydrazone-based hole-transport molecules in organic layered photoconductors: spectroscopic characterization and effect on electrical properties

Pacansky¹,

Waltman²,

Grygier³

et al. 1991

Chem. Mater.

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Section: Introductionmentioning

confidence: 99%

Photoconductor fatigue. 1. Photochemistry of hydrazone-based hole-transport molecules in organic layered photoconductors: spectroscopic characterization and effect on electrical properties

Pacansky¹,

Waltman²,

Grygier³

et al. 1991

Chem. Mater.

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Acid generation and deprotecting reaction by diphenyliodonium 9,10‐dimethoxyanthracene‐2‐sulfonate in a novolak positive photoresist based on chemical amplification

Naitoh¹,

Yamaoka²,

Umehara

1992

Polymers for Advanced Techs

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In a positive photoresist composed of diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate as a novel photoacid generator, bisphenol A protected with tertbutoxycarbonyl group as a dissolution inhibitor, and a novolak resist matrix, the efficiency of photo-acid generation and deprotective reaction were investigated by means of UV-visible and IR spectroscopies. The quantitative measurement of photogenerated acid by using the acid-sensitive dye exhibited 0.18 as the quantum yield of acid generation in novolak resin film. The lithographic evaluation of this system as a chemically amplified resist was studied. The catalytic chain length for the acidcatalyzed deprotection step was determined as about 100 when 10 min post-exposure bake (PEB) at 80°C was given. The sensitivity and the resolution as a positive resist are 180 mJ/cm2 and higher than 1 p m , respectively under the PEB conditions mentioned above.

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Pulse plating of quarter micron gold patterns on silicon X-ray masks

Löchel

Maciossek

Trube

et al. 1990

Microelectronic Engineering

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High sensitivity positive tone x-ray resist: RAY-PF-performance under e-beam exposure

Cited by 5 publications

References 5 publications

Photoconductor fatigue. 1. Photochemistry of hydrazone-based hole-transport molecules in organic layered photoconductors: spectroscopic characterization and effect on electrical properties

Photoconductor fatigue. 1. Photochemistry of hydrazone-based hole-transport molecules in organic layered photoconductors: spectroscopic characterization and effect on electrical properties

Acid generation and deprotecting reaction by diphenyliodonium 9,10‐dimethoxyanthracene‐2‐sulfonate in a novolak positive photoresist based on chemical amplification

Pulse plating of quarter micron gold patterns on silicon X-ray masks

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