High-resolution x-ray-scattering study of the structure of niobium thin films on sapphire

Phase decomposition and chemical inhomogeneity inNd2−xCexCuO4±Mang1, Larochelle2, Mehta3 et al. 2004Phys. Rev. B9861130View full textAdd to dashboardCite

“…An upper-bound estimate is provided by using the formula for diffraction from an N -slit grating: sin(N πz)/ sin(πz), where N is the number of unit-cell layers of the secondary phase and z is expressed in reciprocal lattice units. 25 The two functional forms provide estimates of the thickness that differ by approximately 40%. The N -slit formula assumes that the epitaxial layers are of uniform thickness, and also implies the existence of secondary diffraction maxima (see, for example, Fig.…”

Characterization of epitaxial growth of Fe(110) on (11−20) sapphire substrates driven by Mo(110) seed layers

“…They are also obtained at a low temperature growth (380 K) with successive annealing [24]. In order to reduce inplane twinning of crystallites and mosaicity, the Mo seed layer has to be deposited at temperatures as high as possible (up to 1060 K) [25,26].…”

Surface and structural disorder in MBE and sputtering deposited Cu thin films revealed by X-ray measurements

“…The lateral correlation length of the roughness can be estimated by measuring the width of the diffuse part of the spectrum along Q J [19]. The values obtained for the different samples, by measuring the FWHM of the diffuse part of the spectrum in correspondence of the first Kiessig fringe [21], are reported in Table 1. For the MBE deposited thin films, the lateral correlation length decreases with the deposition rate and the minimum value approaches that obtained in the case of sputtered deposited thin films.…”

“…This is commonly observed in the case of multilayers [18,20], where the roughness can propagate periodically along the growth direction reinforcing the diffuse intensity in correspondence of the Bragg reflections. In the case of single layers, the presence of correlated roughness between the substrate and the film surface gives rise to the observed weak increase of the diffuse intensity [19,21]. The lateral correlation length of the roughness can be estimated by measuring the width of the diffuse part of the spectrum along Q J [19].…”